Applied Materials, Inc. announced
its new Applied FullVision™ system that enables real-time
control of dielectric CMP1 processes to the 45 nanometer (nm) device
node and beyond. The FullVision system couples Applied’s
patented window-in-pad technology with multiple-wavelength spectroscopy
to deliver advanced in situ endpoint capability for a variety of
dielectric materials, including oxide, STI2, and poly CMP applications.
The system demonstrates high repeatability across all applications with
less than 150 angstrom, 3-sigma endpoint accuracy on patterned wafers.
A major advance over single wavelength endpoint technologies, the
FullVision system offers improved measurement accuracy with 50% higher
reliability for dielectric applications.
“CMP endpoint technology was pioneered by Applied
Materials and is key to delivering benchmark CMP
performance,” said Dr. Hichem M’Saad, vice
president and general manager of Applied Materials’
Dielectric Systems and CMP Business Group. “As films become
thinner, CMP becomes increasingly difficult, requiring much more
precise wafer-to-wafer process control to achieve acceptable yields.
Using broadband spectral analysis, FullVision technology monitors
individual polishing zones across the wafer to provide twice the
accuracy and repeatability of competitive systems on a wide variety of
process steps – without compromising throughput. These are
vital requirements for advanced device manufacturing.”
The FullVision system has already been adopted by major memory
customers on their Applied Reflexion® LK CMP systems in high
volume manufacturing. For these customers, the system has enabled
higher CMP yield by significantly reducing wafer scrap caused by drifts
in consumable sets and incoming wafer profile variations.
Applied Materials leads the industry in CMP technology
— with an installed base of more than 900 300mm CMP systems
worldwide — and in providing advanced in situ metrology for
ensuring best-of-breed planarization performance. See http://appliedmaterials.com/products/reflexion_lk_cmp_4.html
for more information on the Applied FullVision endpoint system.