At the 2008 NSTI Nanotechnology Conference and Trade Show
held in Boston, Massachusetts, Finnish Atomic Layer Deposition (ALD)
reactor manufacturer Picosun Oy today announced three
new orders for its flagship SUNALE™ R-series Advanced ALD
research reactors from three leading U.S. universities.
“Picosun personnel possesses over 200 years of
combined ALD experience. Company CTO Sven Lindfors has been designing
ALD reactors continuously since 1975, and the actual inventor of the
ALD method, Dr. Tuomo Suntola serves as Member of the Board of
Directors of Picosun. With its unrivalled experience Picosun has been
one of the best kept secrets of nanotechnology in recent years, but
customer interest is now raising it to the forefront of the ALD
explosion,” says Dr. Charles L. Dezelah, General Manager of
Picosun´s U.S. operations.
“I am extremely happy of the speed with which
Picosun´s North American business has taken off,”
Charles Dezelah says. “Picosun´s U.S. office was
opened less than a year ago. We have already installed ALD reactors at
several customer locations in the U.S. Names of our three new customers
will be published once their reactors have been installed and approved
for use.”