At AVS ALD 2008, the 8th International Conference on Atomic Layer Deposition
held in Bruges, Belgium, Finnish Atomic Layer Deposition (ALD) reactor manufacturer
Picosun Oy today re-introduced
Dr Tuomo Suntola, Finnish scientist who received the European SEMI award in
2004 for inventing the ALD method, to a whole new generation of ALD-enthusiasts.
“Dr Suntola has not been actively participating in ALD events during
past few years. That is why there is a complete generation of people working
with ALD who have not had a chance to meet him in person before. He has,
however, served as Executive Advisor to and, since 2007, Member of the Board
of Directors of the Finnish ALD powerhouse Picosun. Picosun has been one of
the best kept secrets of ALD, but the silence around the company has now
been lifted,” says Juhana Kostamo, Managing Director of Picosun.
“We have used the past four years to build a platform from which we
reach the top of the ALD world. We now have un-matched products both for R&D
and production, the quality of which is not defined by empty advertising
phrases but unparalleled hard measured facts from actual equipment used by
some of the world’s leading universities and research institutions. We
also have first actual user long-term measured results from our new SUNALE™
P-series production reactors confirming that we have, indeed, products which
master the most important thin film deposition equipment requirements –
uniformity, repeatability and particle performance – with flying colours,”
Juhana Kostamo explains.
Dr Suntola and Picosun’s Chief Technology Officer Sven Lindfors are
available for discussions at the Picosun exhibition booth at the ALD 2008 conference
today June 30th at 10:00-10:30 a.m.; 12:30-2:00 p.m.; 3:30-4:00 p.m. and from
5:30 p.m. onwards (Central European Time).