Picosun Oy Re-Introduced Dr Tuomo Suntola at ALD Conference

Published on June 30, 2008 at 10:34 AM

At AVS ALD 2008, the 8th International Conference on Atomic Layer Deposition held in Bruges, Belgium, Finnish Atomic Layer Deposition (ALD) reactor manufacturer Picosun Oy today re-introduced Dr Tuomo Suntola, Finnish scientist who received the European SEMI award in 2004 for inventing the ALD method, to a whole new generation of ALD-enthusiasts.

“Dr Suntola has not been actively participating in ALD events during the past few years. That is why there is a complete generation of people working with ALD who have not had a chance to meet him in person before. He has, however, served as Executive Advisor to and, since 2007, Member of the Board of Directors of the Finnish ALD powerhouse Picosun. Picosun has been one of the best kept secrets of ALD, but the silence around the company has now been lifted,” says Juhana Kostamo, Managing Director of Picosun.

“We have used the past four years to build a platform from which we will reach the top of the ALD world. We now have un-matched products both for R&D and production, the quality of which is not defined by empty advertising phrases but unparalleled hard measured facts from actual equipment used by some of the world’s leading universities and research institutions. We now also have first actual user long-term measured results from our new SUNALE™ P-series production reactors confirming that we have, indeed, products which master the most important thin film deposition equipment requirements – uniformity, repeatability and particle performance – with flying colours,” Juhana Kostamo explains.

Dr Suntola and Picosun’s Chief Technology Officer Sven Lindfors are available for discussions at the Picosun exhibition booth at the ALD 2008 conference today June 30th at 10:00-10:30 a.m.; 12:30-2:00 p.m.; 3:30-4:00 p.m. and from 5:30 p.m. onwards (Central European Time).

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