Site Sponsors
  • Park Systems - Manufacturer of a complete range of AFM solutions
  • Oxford Instruments Nanoanalysis - X-Max Large Area Analytical EDS SDD
  • Strem Chemicals - Nanomaterials for R&D

An Impressive Increase in People's Interest in Picosun Package

Published on July 4, 2008 at 9:14 PM

AVS ALD 2008, the 8th International Conference on Atomic Layer Deposition held in Bruges, Belgium, became a convincing step forward for Picosun Oy, the Finnish Atomic Layer Deposition (ALD) reactor manufacturer. "We registered an impressive increase in people's interest in the Picosun Package, the combination of hardware, software, training, consulting and service solutions offered by the company," says Juhana Kostamo, Managing Director of Picosun.

“As a direct result of our performance during the Conference, we received some three dozen extremely serious enquiries from the scientific community, research institutions and various business enterprises,” Juhana Kostamo says.

“I have often said that our strategy of building a firm foundation on first class products and first tier customers telling others of the quality of our package is going to be a formula for unprecedented success. I am happy to say that we are now seeing clear signs of this,” Mr. Kostamo says.

During the ALD conference, Picosun Oy re-introduced the inventor of the ALD method, Doctor Tuomo Suntola, to a whole new generation of ALD-enthusiasts. Picosun also successfully introduced world’s most experienced designer of ALD systems, Mr. Sven Lindfors, to the wide global ALD community. Today, Suntola is Member of the Board of Directors and Lindfors is Chief Technology Officer of Picosun.

“People at the conference were actually asking autographs from Dr Suntola and Sven Lindfors. And, indeed, they are the stars of the ALD world, dating their unique co-operation back to the earliest days of the method,” says Juhana Kostamo.

Daniel Lewis Ray, from the University of Colorado at Boulder, recently praised Dr. Suntola as the inventor of the ALD method back in 1974 in his spotlight article at www.nanowerk.com, and went on to say: “Despite being invented more than three decades ago, the technique of atomic layer deposition is continuing to advance and it promises to hold the key to perhaps hundreds of future advancements. From the creation of new or more effective chemicals to the development of mechanically driven computers, everything suggests that ALD's role in nanotechnology and nanoscience will only continue to grow.”

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit