AVS ALD 2008, the 8th International Conference on Atomic Layer Deposition
held in Bruges, Belgium, became a convincing step forward for Picosun
Oy, the Finnish Atomic Layer Deposition (ALD) reactor manufacturer. "We
registered an impressive increase in people's interest in the Picosun Package,
the combination of hardware, software, training, consulting and service solutions
offered by the company," says Juhana Kostamo, Managing Director of Picosun.
“As a direct result of our performance during the Conference, we received
some three dozen extremely serious enquiries from the scientific community,
research institutions and various business enterprises,” Juhana Kostamo
“I have often said that our strategy of building a firm foundation on
first class products and first tier customers telling others of the quality
of our package is going to be a formula for unprecedented success. I am happy
to say that we are now seeing clear signs of this,” Mr. Kostamo says.
During the ALD conference, Picosun Oy re-introduced the inventor of the ALD
method, Doctor Tuomo Suntola, to a whole new generation of ALD-enthusiasts.
Picosun also successfully introduced world’s most experienced designer
of ALD systems, Mr. Sven Lindfors, to the wide global ALD community. Today,
Suntola is Member of the Board of Directors and Lindfors is Chief Technology
Officer of Picosun.
“People at the conference were actually asking autographs from Dr Suntola
and Sven Lindfors. And, indeed, they are the stars of the ALD world, dating
their unique co-operation back to the earliest days of the method,” says
Daniel Lewis Ray, from the University of Colorado at Boulder, recently praised
Dr. Suntola as the inventor of the ALD method back in 1974 in his spotlight
article at www.nanowerk.com, and went on to say: “Despite being invented
more than three decades ago, the technique of atomic layer deposition is continuing
to advance and it promises to hold the key to perhaps hundreds of future advancements.
From the creation of new or more effective chemicals to the development of mechanically
driven computers, everything suggests that ALD's role in nanotechnology and
nanoscience will only continue to grow.”