SUSS MicroTec, a supplier
of innovative solutions for the 3D, MEMS, Advanced Packaging and Nanotechnology
markets, announced today that the capabilities of its manual mask aligners are
now enhanced with a new nanoimprint toolkit, that enables them to pattern large
areas with repeatable sub-50 nm printing capability. The new technology called
SCIL (Substrate Conformal Imprint Lithography) has been developed by Philips
Research, Eindhoven/The Netherlands and transferred to SUSS MicroTec in a technology
SCIL is bridging the gap between small rigid stamp NIL (nano imprint lithography)
application for best resolution and large-area soft stamp usage with usually
limited printing resolution below 200 nm. Its excellent performance in terms
of substrate conformity and pattern fidelity over large areas makes this imprint
technology a powerful tool, especially for applications like high brightness
LEDs, high-efficient laser diodes or BPM (bit patterned media) to use in next-generation
hard disc drives.
The SCIL toolkit can be field-installed on any SUSS MA6/8 Mask Aligner with
very limited effort. MiPlaza, the open innovation center located at the High
Tech Campus Eindhoven, is also looking into specific process requirements, MiPlaza
(Microsystems Plaza), part of Philips Research, offers world-class expertise,
service and infrastructure to high-tech organizations inside and outside Philips.
MiPlaza is investigating further process development in the field of substrate
conformal imprint lithography.
"This cooperation with Philips Research and MiPlaza demonstrates SUSS
Micro Tec's continued commitment to bringing the most innovative technology
to the marketplace," said Rolf Wolf, general manager of SUSS MicroTec's
lithography division. "SCIL represents an enabling and revolutionary approach
to large-area nanoimprint applications."