Carl Zeiss SMT has received
the next order for their Photomask Registration and Overlay Metrology System
PROVE™ from Samsung Electronics, the Korean Integrated Device Manufacturer.
The order was placed consecutively after a recent order from the leading e-beam
mask writer supplier NuFlare.
“Considering the current market situation, this is a remarkable success.
These orders clearly confirm that PROVE™ with its high resolution 193nm
imaging optics is an enabling technology for mask manufacturing at 32nm node
and beyond. For strategically operating companies, regardless of whether they
are mask writer manufacturers, IDM or mask shops there is no alternative but
to work with ZEISS registration technology if they want to meet and exceed their
aggressive roadmaps.” states Dr. Oliver Kienzle, Member of the Board at
Carl Zeiss SMT´s Semiconductor Metrology Systems division (SMS).
The new metrology system PROVE™ was developed by a team of more than
40 Carl Zeiss SMT engineers and is supported by SEMATECH.