Picosun Oy and Vaisala Oyj Working Together for integration of ALD Process to High Volume Manufacturing

Published on January 29, 2009 at 5:59 PM

Leading Atomic Layer Deposition (ALD) systems manufacturer Picosun Oy, Finland, and Vaisala Oyj, Finland-based global market leader in meteorological measurements technology announced today that since 2006 they have worked together for integration of ALD process to high volume manufacturing (HVM). Vaisala has been using Picosun SUNALE™ P-series reactor since late 2006 and began its use in HVM in the early summer of 2007.

Vaisala, global market leader in many of its core businesses, develops, manufactures and markets products and services for environmental and industrial measurement. The major customer groups of Vaisala are meteorological and hydrological institutes, aviation organizations, defense forces, road and rail organizations, weather related private sector, system integrators and industry worldwide.

"We are extremely proud that Vaisala has chosen Picosun as their ALD tool provider. We are more than happy to announce the exceptional results they have been able to gather since 2006. The ALD process performance in high volume manufacturing, including film uniformity, particles and repeatability, has consistently met the expectations. Our co-operation with Vaisala will lead to new results in implementation of ALD in production, and further strengthen the market position of our SUNALE™ ALD process production tools", says Juhana Kostamo, Managing Director of Picosun Oy.

"We have been satisfied with the results got with Picosun's ALD-reactor. For us easy maintenance, use of commercial standard parts, batch process capability and good reliability were important when we chose our ALD production tool ", says Dr. Antti Rahtu, Manufacturing Manager of Vaisala Oyj.

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