Leading Atomic Layer Deposition (ALD) systems manufacturer Picosun
Oy, Finland, and Vaisala Oyj, Finland-based global market leader in meteorological
measurements technology announced today that since 2006 they have worked together
for integration of ALD process to high volume manufacturing (HVM). Vaisala has
been using Picosun SUNALE™ P-series reactor since late 2006 and began
its use in HVM in the early summer of 2007.
Vaisala, global market leader in many of its core businesses, develops, manufactures
and markets products and services for environmental and industrial measurement.
The major customer groups of Vaisala are meteorological and hydrological institutes,
aviation organizations, defense forces, road and rail organizations, weather
related private sector, system integrators and industry worldwide.
"We are extremely proud that Vaisala has chosen Picosun as their ALD tool
provider. We are more than happy to announce the exceptional results they have
been able to gather since 2006. The ALD process performance in high volume manufacturing,
including film uniformity, particles and repeatability, has consistently met
the expectations. Our co-operation with Vaisala will lead to new results in
implementation of ALD in production, and further strengthen the market position
of our SUNALE™ ALD process production tools", says Juhana Kostamo,
Managing Director of Picosun Oy.
"We have been satisfied with the results got with Picosun's ALD-reactor.
For us easy maintenance, use of commercial standard parts, batch process capability
and good reliability were important when we chose our ALD production tool ",
says Dr. Antti Rahtu, Manufacturing Manager of Vaisala Oyj.