Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. A major feature in the evolution of modern technologies is the important role of surfaces and near-surfaces on the properties of materials. This book focuses on the fundamental physics underlying the techniques used to analyze the surfaces and near-surfaces. New analytical techniques have emerged to meet these technological requirements, and all are based on a few processes that govern the interactions of particles and radiation with matter. This book addresses the fundamentals and application of these processes.
Table of contents
Concepts, Units, and the Bohr Atom.- Atomic Collisions and Backscattering Spectrometry.- Energy Loss of Light Ions and Backscattering Depth Profiles.- Sputter Depth Profiles and Secondary Ion Mass Spectrometry.- Ion Channeling.- Electron -Electron Interactions and Depth Sensitivity of Electron Spectroscopies.- X-ray Diffraction.- Electron Diffraction.- Photon Absorption in Solids and EXAFS.- X-ray Photoelectron Spectroscopy.- Radiative Transitions and Electron Microprobe.- Nonradiative Transitions and Auger Electron Spectroscopy.- Nuclear Techniques: Activation Analysis and Prompt Radiation Analysis.- Scanning Probe Microscopy.-Appendices: Km for 4He as Projectile and integer Target Mass.- Rutherford Scattering Cross Section of Elements for 1 MeV 'He.- 4He Stopping Cross Sections.- Electron Configurations and Ionization Potentials of Atoms.- Electron Binding Energies (eV).- X-ray Wavelengths.- Mass Absorption Coefficients and Densities.- KLL Auger Energies (eV).- Fluorescence Yields for K, L, and M Shells.
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