Materials scientists and engineers have made significant developments in the improvement of methods of synthesis of nanomaterial solids. A brief review is given in this article.
http://www.azonano.com/article.aspx?ArticleID=1710 | 24 Aug 2006
The bottom-up approach comprises several different methods, including sol-gel, aerosol-based and spraying techniques, Chemical Vapour Deposition (CVD), atomic or molecular condensation, supercritical...
http://www.azonano.com/article.aspx?ArticleID=1079 | 14 Dec 2004
Metal alkoxides of copper, tantalum, vanadium, zirconium, titanium, hafnium, and aluminum have been explored as precursors to form oxide thin films using CVD/ALD. Using proper precursors, the CVD/ALD...
http://www.azonano.com/article.aspx?ArticleID=3425 | 4 May 2013
Metal halides were the first kind of precursor used in CVD processes. They are relatively inexpensive and readily available.
http://www.azonano.com/article.aspx?ArticleID=3432 | 4 May 2013
Metal alkyl amides are important as single source CVD precursors for nitride thin films. Basic reagents such as oxygen, water, ozone can react with metal alkyl amides to produce oxide films.
http://www.azonano.com/article.aspx?ArticleID=3426 | 4 May 2013
Process conditions have a considerable impact on material properties that are produced with the help of ALD/CVD, the right selection of precursors is very important in order to obtain the desired...
http://www.azonano.com/article.aspx?ArticleID=3424 | 4 May 2013
Cyclopentadienyl (Cp) complexes have become attractive precursors for CVD/ALD as they are normally volatile and reactive towards water at considerable temperatures and often form films with minimal...
http://www.azonano.com/article.aspx?ArticleID=3430 | 4 May 2013
For certain metals, such as nickel, chromium, iron, molybdenum, rhenium, rhodium and tungsten, carbonyl precursors have proved to be ideal, as they allow the metals to be deposited at reduced...
http://www.azonano.com/article.aspx?ArticleID=3429 | 4 May 2013
Aluminum and zinc alkyls are the most popular metal alkyl compounds used in CVD process. These alkyl compounds are suitable for producing sulfide and oxide films.
http://www.azonano.com/article.aspx?ArticleID=3427 | 4 May 2013
Extensive research is ongoing to explore the role of acetylacetonate (acac) complexes and their derivatives as precursors for depositing oxide films using CVD/ALD.
http://www.azonano.com/article.aspx?ArticleID=3431 | 4 May 2013