Nanophase Technologies has announced what it believes is the first commercial nanoscale availability of an innovative family of high surface area, very pure nanocrystalline rare earth oxides. Posted...
http://www.azonano.com/article.aspx?ArticleID=315 | 16 Dec 2003
Nanophase Technologies is an industry-leading nanocrystalline materials innovator and manufacturer with an integrated family of nanomaterial technologies.
http://www.azonano.com/article.aspx?ArticleID=1647 | 21 Jul 2006
Reportlinker.com announces that a new market research report related to the
Chemicals industry is available in its catalogue.
Mechanical Polishing (CMP) Equipment and Materials...
http://www.azonano.com/news.aspx?newsID=8976 | 2 Dec 2008
Microelectronics Corporation, the world’s leading
supplier of chemical mechanical planarization (CMP) polishing slurries
to the semiconductor industry, announces a major breakthrough in...
http://www.azonano.com/news.aspx?newsID=4422 | 11 Jul 2007
SVTC Technologies today
announced a partnership with Entrepix, Inc. to provide 300 mm chemical mechanical
polishing (CMP) development and production services for customers who use the
http://www.azonano.com/news.aspx?newsID=9745 | 4 Feb 2009
Araca, Inc., a leading
provider of analytical products and services for chemical mechanical planarization
(CMP) research and development, today announced that it has entered into a Master...
http://www.azonano.com/news.aspx?newsID=20535 | 15 Nov 2010
Research and Markets has announced the addition of the "CMP Consumables Critical Materials" report to their offering.
The global CMP consumables market has emerged from 2008-2009 recession with 2010...
http://www.azonano.com/news.aspx?newsID=20625 | 20 Nov 2010
Entrepix, Inc., a leading
provider of equipment and services to the mainstream, "More than Moore"
and novel device manufacturers, announced that it will use Semi Scenic as its...
http://www.azonano.com/news.aspx?newsID=7985 | 7 Oct 2008
Applied Materials, Inc. announced
its new Applied FullVision™ system that enables real-time
control of dielectric CMP1 processes to the 45 nanometer (nm) device
node and beyond. The...
http://www.azonano.com/news.aspx?newsID=5440 | 30 Nov 2007
Research and Markets (http://www.researchandmarkets.com/research/130a19/the_world_market_f) has announced the addition of the "The World Market for Chemical Mechanical Planarization (CMP) Equipment"...
http://www.azonano.com/news.aspx?newsID=16301 | 6 Mar 2010