Cabot Microelectronics is the leading supplier of sophisticated polishing compounds and a provider of polishing pads used in the manufacture of advanced semiconductors (chips) and rigid...
Founded in 1984, Novellus Systems Inc. is a leading supplier of chemical vapor
deposition (CVD), physical vapor deposition (PVD), electrochemical deposition
(ECD), chemical mechanical...
Strasbaugh has over 60 years of leadership in design and manufacturing of advanced
surfacing technology for the global Semiconductor, Silicon, Data Storage, MEMS,
LED, Telecommunications and...
Nanomag has secured new technology manufacturing functional powders such as
metal powder and ceramics powder using nano technology. We manufacture and research
CeO2 powder for CMP which is...
Cadence Design Systems, Inc. and Applied Materials, Inc. today announced the companies are collaborating on a development program to optimize the chemical-mechanical planarization (CMP) process...
http://www.azonano.com/news.aspx?newsID=33099 | 23 Jun 2015
In direct alignment with Governor Andrew M. Cuomo’s high-tech public-private partnership model for economic growth in New York State, SUNY Polytechnic Institute’s Colleges of Nanoscale...
http://www.azonano.com/news.aspx?newsID=32663 | 29 Apr 2015
Reportlinker.com announces that a new market research report related to the Chemicals industry is available in its catalogue.
Chemical Mechanical Polishing (CMP) Equipment and Materials
http://www.azonano.com/news.aspx?newsID=8976 | 2 Dec 2008
Microelectronics Corporation, the world’s leading
supplier of chemical mechanical planarization (CMP) polishing slurries
to the semiconductor industry, announces a major breakthrough in...
http://www.azonano.com/news.aspx?newsID=4422 | 11 Jul 2007
Distinguished University Professor S.V. Babu has led two decades of chemical-mechanical planarization (CMP) research and development at Clarkson University's Center for Advanced Materials...
http://www.azonano.com/news.aspx?newsID=33060 | 18 Jun 2015
SVTC Technologies today
announced a partnership with Entrepix, Inc. to provide 300 mm chemical mechanical
polishing (CMP) development and production services for customers who use the
http://www.azonano.com/news.aspx?newsID=9745 | 4 Feb 2009