Strasbaugh has over 60 years of leadership in design and manufacturing of advanced
surfacing technology for the global Semiconductor, Silicon, Data Storage, MEMS,
LED, Telecommunications and...
Cabot Microelectronics is the leading supplier of sophisticated polishing compounds and a provider of polishing pads used in the manufacture of advanced semiconductors (chips) and rigid...
The ASML 5500/9xx, in the Triangle National Lithography Center (TNLC), is a state-of-the-art, 193 nm optical lithography system for rapid turnaround time and high volume patterning. This stepper is...
Researchers at imec and
at the Center for Advanced Materials Processing (CAMP) of the Clarkson University
in Potsdam, New York (U.S.) have recently started a collaboration to study the...
http://www.azonano.com/news.aspx?newsID=17130 | 20 Apr 2010
Reportlinker.com announces that a new market research report related to the Chemicals industry is available in its catalogue.
Chemical Mechanical Polishing (CMP) Equipment and Materials
http://www.azonano.com/news.aspx?newsID=8976 | 2 Dec 2008
According to a new market research report available at Electronics.ca Publications,
Chemical Mechanical Polishing Equipment and Materials, the global market for
chemical mechanical polishing...
http://www.azonano.com/news.aspx?newsID=8556 | 8 Nov 2008
Applied NanoWorks have released nano-sized abrasives for use in applications such as chemical mechanical polishing (CMP). They have available silica, alumina, zirconia and ceria abrasives in water...
http://www.azonano.com/article.aspx?ArticleID=990 | 25 Jun 2004
Building on earlier teamwork with Lewis University, Pall Corporation today announced that scientists from both organizations have expanded research into optimizing filtration technology for...
http://www.azonano.com/news.aspx?newsID=26795 | 7 Mar 2013
Malvern provides the materials and biophysical characterization technology and expertise that enables scientists and engineers to investigate, understand and control the properties of dispersed...
Distinguished University Professor S.V. Babu has led two decades of chemical-mechanical planarization (CMP) research and development at Clarkson University's Center for Advanced Materials...
http://www.azonano.com/news.aspx?newsID=33060 | 18 Jun 2015