Article - 1 Jul 2006
Nanomaterials have a long tradition at Degussa. The company already has several decades of experience with AEROSIL® fumed silica and AEROXIDE® fumed alumina and titania. Advanced Nanomaterials has...
Article - 24 Aug 2006
Materials scientists and engineers have made significant developments in the improvement of methods of synthesis of nanomaterial solids. A brief review is given in this article.
Article - 19 Nov 2003
Scientists have developed the first material that consists of a gradient concentration of gold nanoparticles on a silicon substrate. The method used (incorporating organosilanes), for the production...
News - 14 Oct 2008
An international research team led by Professor Rajeev Ahuja, Uppsala University,
has used theoretical calculations to understand a high-pressure structural phase
transition in silane which...
News - 14 Jun 2010
Dr. Stephanie Castro of Nanofilm, the Ohio nanotechnology company, recently authored the article Silane-Based Coatings in Ceramic Industry Magazine. The article addresses the formulation and...
News - 1 Oct 2008
Liming Tang and colleagues from Tsinghua
University in China, have prepared functional silica micro-tube networks
(MTN) using an organogel as a template and a silane-based precursor, via a...
Article - 12 Dec 2006
The Nano Scratch Tester (NST) from CSM Instruments has been accepted as the preferred method for assessing scratch resistance of automobile coatings. This article shows the versatility of the NST in...
Article - 27 Apr 2005
Various methods are used to synthesize silicon nanowires, including Chemical Vapor Deposition (CVD), Plasma Enhanced CVD (PECVD), Laser-Ablation and Evaporation. Scientists are also using Low Pressure...
Article - 6 Nov 2003
Degussa have developed a new acrylic paint system incorporating encapsulated silica nanoparticles. The new technology allows the paint to contain a high solids content without the need for extra...
Article - 24 Nov 2010
In this paper we have shown that ICP-CVD can be used to deposit various materials including SiO2, SiNx,
a-Si and SiC. By using the ICP-CVD technique high quality films are deposited with high...