Titanium dioxide, also known as titanium(IV) oxide or titania, is the naturally occurring oxide of titanium, chemical formula TiO2. It is noteworthy for its wide range of applications, from paint to...
http://www.azonano.com/article.aspx?ArticleID=2282 | 24 Jan 2009
Metal alkoxides of copper, tantalum, vanadium, zirconium, titanium, hafnium, and aluminum have been explored as precursors to form oxide thin films using CVD/ALD. Using proper precursors, the CVD/ALD...
http://www.azonano.com/article.aspx?ArticleID=3425 | 4 May 2013
Metal halides were the first kind of precursor used in CVD processes. They are relatively inexpensive and readily available.
http://www.azonano.com/article.aspx?ArticleID=3432 | 4 May 2013
Metal alkyl amides are important as single source CVD precursors for nitride thin films. Basic reagents such as oxygen, water, ozone can react with metal alkyl amides to produce oxide films.
http://www.azonano.com/article.aspx?ArticleID=3426 | 4 May 2013
Cyclopentadienyl (Cp) complexes have become attractive precursors for CVD/ALD as they are normally volatile and reactive towards water at considerable temperatures and often form films with minimal...
http://www.azonano.com/article.aspx?ArticleID=3430 | 4 May 2013