Founded in 2003, Rogue Valley Microdevices, Inc. is the first company to establish a microelectronics manufacturing facility in the Rogue Valley Area of Southern Oregon. Our facility includes a 1000 sq. ft. class 100 cleanroom where high quality manufacturing services are provided to our customers. The company currently specializes in offering Thin Films such as Silicon Dioxide (SiO2) and Silicon Nitride (Si3N4).
The newly constructed manufacturing facility is specifically designed with separate MOS Clean and non-MOS Clean production areas. Our processing equipment is capable of volume manufacturing yet flexible enough to accommodate wafer sizes from 50mm to 200mm.