The company was found under the name of Roth & Rau Oberflächentechnik GmbH in 1990 and was formed into a stock corporation – the Roth & Rau AG – In 2001. It was the goal of the founders Dr. Dietmar Roth, Dr. Bernd Rau and Dr. Silvia Roth to turn the knowledge on plasma technologies that was gained during their academic studies at the Technical University of Chemnitz into saleable products.
During the 90s Roth & Rau developed customer tailored equipment for plasma and ion beam enhanced thin film deposition and surface treatment for the semiconductor and optical industry and manufactured them for research and dedicated industrial applications. Roth & Rau offers innovative products and technologies for future orientated applications. This traditional business is continued by the subsidiary MicroSystems GmbH.