Bede is the global leader in non-destructive X-ray metrology systems for 90nm technology nodes and below. Bede systems deliver dramatic yield enhancement through the absolute measurement of semiconductor material properties. These include not only thickness, but also measurements of structure, roughness and composition that are crucial for new materials and processes.
Bede systems incorporate one or more of the following X-ray techniques to optimize sensitivity to a given customer process:
Bede's process control solutions provide fast measurement capability on <100 micron test pads and in scribe-lines on product wafers with ScribeView™, reducing process development costs and eliminating the need for monitor wafers.