CSMA

Queens Road
Penkhull Stoke-on-Trent,
Staffordshire, ST4 7LQ
United Kingdom
PH: 44 (01782) 764440
Email: enquiries@csma.ltd.uk
Visit CSMA Website or Request Quote for Further Information

Primary Activity

Material Manufacturer

Company Background

Utilising a wide range of techniques CSMA interrogate surfaces, layer systems and interfaces of most materials. Working with clients to solve problems, as part of a quality control system, to validate a process, in litigation cases using our accredited expert witnesses or routine analysis CSMA can help clients in a range of industries.

Types of analysis undertaken by CSMA:

  • Surface chemical mapping of organic and inorganic chemistry, for applications in the pharmaceutical, packaging and life sciences industries.
  • Film thickness and density determination.
  • Development of novel materials
  • Failure analysis in a wide range of industries including hard discs, microelectronics, life sciences, pharmaceuticals, aerospace, glass and automotive.
  • Determining topographic information.
  • Non-destructive detection of physical defects.
  • Quantitative chemistry of organic and inorganic materials including oxidation states for applications in a variety of technology sectors including non-destructive depth profiling of oxynitrides and ultra thin mixed metal oxides.
  • Dose measurements, dopant diffusion, process monitoring in silicon devices and growth of III/V or II/VI compound semiconductors.
  • Dopant solubility and diffusion measurements in ultra thin layers such as SiGe, stained silicon, oxynitrides, high k materials and a range of new applications in the areas of layers on glass, light emitting devices and MQW in III/V compound semiconductors.
  • Quantitative depth profiling of oxides, nitrides, alloys, BPSG and other complex compounds.
  • Accurate compositional measurements of a wide range of alloys, nitrides and oxides.

Techniques employed by CSMA include:

  • Imaging ToFSIMS (Time-of-Flight Secondary Ion Mass Spectrometry)
  • DSIMS (Dynamic Secondary Ion Mass Spectrometry)
  • ULESIMS (Ultra-Low Energy Secondary Ion Mass Spectrometry)
  • SNMS (Sputtered Neutral Mass Spectrometry)
  • XPS (X-Ray Photoelectron Spectroscopy)
  • XRD (X-Ray Diffraction)
  • XRF (X-Ray Fluorescence)
  • TEM (Transmission Electron Microscopy)
  • SEM/EDX (Scanning Electron Microscopy/Energy Dispersive Analysis)
  • SAM (Scanning Acoustic Microscopy)
  • RBS (Rutherford Backscattering Spectroscopy)
  • 3DP (Non-contact Surface Profiling)
  • FTIR (Fourier Transform Infra Red Spectroscopy)
  • GC-MS (Gas Chromatography-Mass Spectrometry)
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