Large batch PECVD System: PlasmaPro 1000 Stratum

The PlasmaPro 1000 PECVD tool from Oxford Instruments offers excellent benefits for manufacturers of LED. The large batch PECVD tool has been developed particularly for passivation deposition in LED production and for the deposition of SiO2 and SiNx layers. It has a large area electrode and optimized shower head design allows up to: 61 x 2”, 15 x 4” and 7 x 6” wafers in a single load.

Key Features

The key features of the PlasmaPro 1000 PECVD tool are:

  • High quality device performance and yield
  • Consistent hardware and ease of serviceability for excellent uptime
  • The PlasmaPro 1000 Stratum offers excellent benefits for LED manufacturers
  • 490mm electrode offers superior throughput from industry leading batch sizes of up to 7 x 6” wafers
  • Low cost of ownership
  • Optimized for batch production, the PlasmaPro 1000 Stratum has a vacuum load lock as standard, with open load and cluster capability options
  • System is developed to minimize cleaning overhead Applications Plasma Enhanced Chemical Vapour Deposition (PECVD) of the following materials is possible using the PlasmaPro 1000 Stratum PECVD tool:
  • Dielectrics
  • Metal Nitrides
  • Metal Oxides

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