The MCM-100 is an ion sputter coater for non-conductive samples. The sputter coater applies a nano-thin layer of conductive metal thus allowing imaging at the maximum resolution and magnifications without the concern of electron charge effects.
Non-conductive samples need a nano-thin coating to prevent electron charging and improve imaging. While non-conductive samples can be imaged in Low Vacuum mode, a sputter coater is an important tool for electron microscopy to attain the maximum magnifications and best quality images. These ion sputter coaters offer super simple operation at a low cost.
Two sputter coater models are available for rapidly applying an ultra-thin coating of conductive material to non-conductive samples to stop charging while under e-Beam imaging. These coaters are highly simple to use and can significantly enhance imaging resolution and sharpness. For EDS analysis, carbon coaters are normally used.
The MCM-100, the basic coater, is completely self-contained needing only electrical power. The vacuum pump is integrated internally into the system making this unique coater the most space-saving and economical solution for sputter coating. The MCM-100 is the ideal coater for standard sample conductivity preparation.
- Fast and easy coating: Press Start -> Automatic Vacuum -> Plasma Coating -> Vent
- Coating current is user settable and displayed
- Coating time is user settable and displayed
- Minimal installation space needed with a self-contained vacuum pump
The MCM-200 is integrated with an LCD touch-screen user interface for operation. The external vacuum pump allows the faster and higher vacuum to be accomplished as compared to the MCM-100 with a higher vacuum frequently resulting in a marginally smaller coated grain size.
||Φ120 mm x 65 mm
||Φ130 mm x 110 mm
|Max Sample Size
|Target to Sample Distance
||180(W) x 310(D) x 310(H)
||308(W) x 285(D) x 256(H)
||10 kg (without pump)