The ionLINE Plus from Raith is designed to meet nanofabrication challenges by realizing the synergy of a focused ion beam and a mature lithography architecture. It integrates a variety of direct FIB processing methods with unparalleled stability, reproducibility, automation and high resolution of a lithography instrument.
FIB methods can make nanofabrication more efficient by using direct patterning (milling, etching, deposition) or hard masking and launch new processes based upon maskless ion implantation or surface functionalization. The ionLINE Plus has been developed as an answer to the quickly growing interest in ion beam based nanofabrication in various areas of R&D. Its unique nanoFIB Three ion column delivers superior placement accuracy, high resolution, long-term stability and record low beam tails.
ionLINE Plus Product Details
- Direct and 3D nanofabrication
- Deposition and Gas Assisted Etching (GAE)
- Ga-free nanofabrication
- Nanoengineering platform
- 35 kV
- Ions: Ga, (Si, Au)
- 4” full travel
- Large Z travel
- Rotation and tilt
Unique writing mode:
The focused ion beam system ionLINE Plus can accept and precisely navigate on samples up to 100 mm in size.
Focused Ion Beam Benefits
- True 3D direct patterning, also on topographic samples
- Simplified processes and process development for quickest time to results
- Versatile FIB methods for challenging or new materials
Advanced FIB Nanofabrication
- Guaranteed sub-10 nm FIB nanofabrication and outstanding beam spot characteristics
- Multiple ion species beyond gallium (IONselect technology)
- Lithography-class stability and accuracy over extended periods of time and areas
- Laser interferometer stage for maximum precision and true field stitching or continuous patterning
Advanced Chamber for Evolutionary FIB System
The new chamber design of the ionLINE Plus supports a configurable setup that can be easily upgraded in the future. Among other features, the focused ion beam system can be fitted with a variety of multi-line and mono-line gas injection systems. Inclusion of multiple GISs from different opposite directions allows for gas-induced processes such as wiring of nano-objects and X-section analysis. Gas-assisted etching offers better selectivity, improved removal rates and less redeposition.
An additional new feature is a nanoprofilometer as an add-on option, which enables both 3D process control and lateral secondary electron imaging information. The 3D surface imaging solution nanoSense helps to qualify etching, deposition and milling processes in situ within minutes. Additional options include cartesian nano-manipulators, chamber de-contaminator, various optical cameras, sample auto height sensing and more.
IONselect Technology - FIB Nanofabrication Beyond Gallium
The nanoFIB Three technology is used for the constant delivery of silicon, gold or other ions with nanometer beam diameters. The flow enhanced alloy ion source and low aberration ion optics enable easy switching between numerous ion species from a single source, while maintaining the high resolution and stability of the nanoFIB Three column.
IONselect offers a variety of species from doubly charged light ions to heavy ions and clusters, all with superior handling, enabling different yet-to-be-explored nanofabrication methods. Processing with specific functionalization, low contamination, higher resolution or surface sensitive milling will open doors for new breakthroughs in next-generation research.
Raith’s nanoFIB Three ion column truly defines a new state of the art in FIB technology.
ionLINE Plus Applications
- Large plasmonic array of small features developed by direct FIB milling in gold (Image Credits: University of Stuttgart)
- Advanced prototyping for a truly functional X-ray zone plate (Image Credits: Max-Planck-Institute Stuttgart)
- 3D stitching and FIB milling enables a 1 mm long micro-fluidic mixer channel (Image Credits: Argonne National Laboratory)
- Long-term processing for large and intricate shapes such as a 3D nano absorber structure (Image Credits: Zhejiang University)
- Direct FIB methods enable nanofabrication on highly topographic or suspended samples like AFM or NEMS tips (Image Credits: Zhejiang University)
- FIB cutting of sub-10 nm features like a plasmonic nano antenna has been shown on top of an AFM tip (Image Credits: Stanford University)
- Light ions like Si can be employed for patterning and imaging at the sub-10 nm scale (Image Credits: Raith internal)
- A several mm long coupling device fabricated by milling with stitching (Peking University)
- Direct milling with stitching allows for long waveguides with a field boundary offset on the 10 nm scale (Image Credits: Peking University)