Angstrom Nexdep Series Thin Film Evaporators

The Nexdep physical vapor deposition (PVD) platform provides a balance between economy and versatility. It can be outfitted with the most robust process enhancements without taking up all the room in your lab or your budget.


  • Aeres: Advanced process control software
  • Aluminum or stainless steel chamber options
  • Designed to meet your process requirements
  • Available in high vacuum (HV) and ultra-high vacuum (UHV) base pressures
  • Support for multiple PVD processes, including magnetron sputtering, electron beam evaporation, thermal evaporation, and ion beam processing
  • Can accommodate up to 8 sources
  • Glove box integration available
  • Degrees of automation possible with available load lock, transfer arms, and mask handling
  • Standard 400 mm x 400 mm x 500 mm chamber with sliding and hinged door options
  • International input voltages available
  • Standard fixturing supports up to 300 mm diameter. Please contact us for assistance with larger substrate sizes
  • Installation and comprehensive training available with every system
  • Our detailed training manual teaches new users how to operate and maintain the equipment
  • A comprehensive safety alert and interlock systems helps protect user as well as the equipment
  • 1-Year warranty with responsive and caring customer service

Other Equipment by this Supplier