The Nexdep physical vapor deposition (PVD) platform provides a balance between economy and versatility. It can be outfitted with the most robust process enhancements without taking up all the room in your lab or your budget.
Features
- Aeres: Advanced process control software
- Aluminum or stainless steel chamber options
- Designed to meet your process requirements
- Available in high vacuum (HV) and ultra-high vacuum (UHV) base pressures
- Support for multiple PVD processes, including magnetron sputtering, electron beam evaporation, thermal evaporation, and ion beam processing
- Can accommodate up to 8 sources
- Glove box integration available
- Degrees of automation possible with available load lock, transfer arms, and mask handling
- Standard 400 mm x 400 mm x 500 mm chamber with sliding and hinged door options
- International input voltages available
- Standard fixturing supports up to 300 mm diameter. Please contact us for assistance with larger substrate sizes
- Installation and comprehensive training available with every system
- Our detailed training manual teaches new users how to operate and maintain the equipment
- A comprehensive safety alert and interlock systems helps protect user as well as the equipment
- 1-Year warranty with responsive and caring customer service