Layerava® - Plasma Enhanced ALD System

The Layerava® plasma enhanced ALD system from OkyayTech has a compact reactor design. The ALD system includes a high-density, large-area, hollow cathode source.

The ALD research community widely uses hollow cathode plasma sources as alternatives, for inductively coupled plasma (ICP) sources, since oxygen contamination is less while placing non-oxide materials. In the future, the benefits of hollow cathode plasma sources to the industry could increase considerably.

The system ensures relatively low plasma damage, as well as a very high radical flux, to the point at which the ion signal (ion densities are similar to ICP sources) is flooded by the signal of radicals, during the optical emission spectroscopy measurements.

The Layerava® plasma enhanced ALD system can be configured for use with nitrous oxide, ammonia, chlorine, oxygen, nitrogen, hydrogen, argon, and other gases as well.

Hollow cathode plasma sources have been used with ammonia, chlorine, nitrous oxide, hydrogen, oxygen, nitrogen, argon, and other gases.

Layerava® PE ALD P4/P8/P12 Models

Layerava® PE ALD P4/P8/P12 Models

Image Credit: OkyayTech

  • Delivery of solid/liquid/gas precursors with heated gas distribution lines
  • Substrate heated typically up to 300 °C (and optionally up to 700 °C)
  • Up to eight precursor lines are individually heated up to 200 °C
  • Hollow cathode plasma source up to 600 W
  • Can be configured to 100, 200, and 300 mm substrate sizes and stainless-steel reactor chamber
  • Fully automated with easy-to-use GUI and recipe control
  • 3D Surround Coat™ with high aspect ratio for coatings with a high surface area
  • Up to four MFC-controlled plasma gas manifold (fully GUI/recipe integrated)
  • Top-notch scientific support team and recipe library
  • Precursor bottle consumption tracking and depletion warning system (PDEP)

Options

Layerava® PE ALD P4/P8/P12 Models

Image Credit: OkyayTech

  • Ozone process fully integrated with software package, and automated
  • Manual or automatic load lock
  • In-situ ellipsometer optical metrology and optical ports
  • In-situ QCM thickness monitor
  • RF substrate bias

In-situ ellipsometer signal showing separate components of a single ALD cycle, including desorption, chemisorption, and ligand removal.

 

In-situ ellipsometer signal showing separate components of a single ALD cycle, including desorption, chemisorption, and ligand removal. Image Credit: OkyayTech

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