The Octiv Poly 2.0 - VI Probe available from Impedans Ltd is a multi-frequency in-line RF current, voltage, and phase measurement system. It includes network communication such as EtherCAT, EtherNet/IP, or Ethernet Web Service Protocol.
The Octiv Poly 2.0 - VI Probe can measure numerous fundamental frequencies and their harmonics at the same time, with an accuracy of 1%. The OEM Poly and Suite VI Probes can find and measure up to five fundamental frequencies and all their components (current, voltage, harmonics, and phase angle) simultaneously.
The Octiv Poly 2.0 has pulse mode for investigating and tracking pulsed RF processes.
- Process tool integration
- Fully customizable form factor
- Industrial communication protocols
- Real-time feedback
- Integrated with factory servers
- High reliability using industrial protocols
- Process diagnostic monitoring
The Octiv Poly 2.0 - VI Probe is a precision power and impedance sensor that is typically located after the match box. It is used to quantify the load impedance in applications like plasma processes.
The Octiv VI Probe monitors current, voltage, and phase of numerous fundamental frequencies and their harmonics. It is perfect for precisely monitoring the triple-frequency and dual-frequency plasma systems.
The standard form factor has a power range of 0–12 kW and special units for up to 90kW are available on request. The Octiv Poly 2.0 sensor is calibrated at the Impedans' Advanced RF Calibration Laboratory called Lab RFx, at five different frequencies, for example: 2, 13.56, 27.12, 40.68 and 60 MHz. Any five arbitrary frequencies can be chosen. The frequency-agile system can also take measurements in bands about those chosen frequencies.
Image Credit: Impedans Ltd
The Octiv Poly 2.0 is a high-resolution, high-precision sensor combined with a high-speed data acquisition unit. This sensor is the only precision power and impedance sensor with a microsecond resolution in pulsed applications. It uses exclusive licensed VI probe technology designed for consistent operation in concurrent multi-frequency applications with smart frequency tuning.
The Octiv Poly 2.0 solves problems related to fault detection, poor production yields, RF fingerprinting, RF tool matching, and classification. Hence, the RF parameters are strongly correlated with plasma parameters.
The Octiv Poly 2.0 offers an extensive range of parameters appropriate for use in multi-layered analysis in the development of end-point applications. The sensor enables users to indirectly measure plasma parameters, assisting them to understand and regulate the process.
The Octiv Poly 2.0 helps to define precise process windows and find out the health of power subsystems. It also helps to determine process run-to-run stability. It gives users the confidence and understanding to quantify the power delivery parameters and map the plasma state.
RF Parameters Measured
Time-averaged measurement offers an average over time of phase, voltage, and current.
Time-resolved measurements enable users to synchronize the V, I, and phase measurements with pulsed RF. Users can choose between an external TTL signal or an internal level trigger for pulsed synchronization. These measurements have a time resolution of 1 µs.
Users can subsequently get in-depth information about the ion energy distribution as a function of phase or time through the synchronization pulse period. Normally, the pulse period might be on a timescale of milliseconds to microseconds.
Time-trend measurements enable users to get information about the difference in current, voltage, and phase as time progresses through a specific process, from seconds to hours.