The DWL 2000 laser lithography system is a fast and flexible, high resolution pattern generator for mask making and direct writing. With a write area of up to 200 x 200 mm2 the system is the perfect solution for fast patterning of masks and wafers in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.
In addition to high resolution 2D patterns, the state of the art technology of the system can also create complex 3D structures in thick photoresist with a single pass. This feature enables quick and easy fabrication of custom made micro-optics with refractive or diffractive elements. The design process for these structures is supported by conversion software specifically designed for these 3D applications. The air-bearing based and linear motor driven stage system further improves the quality of the 3D structures by eliminating any mechanically induced vibrations.
The DWL 2000 can utilize different lasers, making it possible to expose nearly all photoresists. A fixed optical setup, a reliable auto focus system and a high precision stage system guarantee the quality and position accuracy of the exposed structures. A high resolution interferometer monitors the position of the stage at all times. To ensure the stability of the system, it is placed in a climate chamber, providing a constant temperature. Additional software is used to compensate for any remaining variation in the mechanical structures or the environmental parameters.