Park NX-Mask: AFM-Based Photomask Repair

The NX-Mask from Park Systems is the next-generation photomask repair system designed to help address some of the challenges associated with shrinking device geometries and rising photomask complexities. Park NX-Mask is a revolutionary tool that incorporates advanced atomic force microscopy technology for repairing high-end EUV Mask.

It offers an all-encompassing solution that includes auto defect review, repair of defects, and verification of the repair, thereby expediting the throughput at an unparalleled repair efficacy.

  • Compatible with a dual pod for handling EUV masks
  • All-in-one solution for locating post-repair verification and defects

Repair of Defects with A Superior Method Completely Safe

Park NX-Mask: AFM-Based Photomask Repair

Image Credit: Park Systems

Debris, such as tin (Sn) particles from a EUV light source, can make its way to the photomask, reducing light reflectivity. Park NX-Mask utilizes its proven nano-mechanical AFM technology to find and remove extraneous particles and the complexity of pattern defects in a completely safe manner. Unlike conventional photomask repair systems, Park NX-Mask executes the repair without causing any damage or perturbing the mask surface.


  • No beam charging
  • No chemical use
  • No vacuum needed


  • Nanometric resolution and precision of repair
  • Economical-lower cost of ownership available
  • Survey scan to repair to verification within a system

Inline Production for Automatic and Seamless Repair

Park NX-Mask provides optimized solutions that support dual pods for handling EUV masks on inline production.

Park NX-Mask: AFM-Based Photomask Repair

Image Credit: Park Systems

Non-Contact AFM Technology for Locating Defects and Post-Repair Verification

Park NX-Mask initially executes a survey scan to identify the defects with its proprietary non-contact AFM technology, providing the safest scanning technique.

From the survey scan, Park NX-Mask learns the quantity and precise location of the defects, and information on each of those particles and faults. After the repair, verification is carried out by Park NX-Mask using its non-contact AFM technology. This generates a nanoscale 3D topography and other metrology data of interest such as surface roughness.

Park NX-Mask: AFM-Based Photomask Repair

Image Credit: Park Systems

Park NX-Mask: AFM-Based Photomask Repair

Image Credit: Park Systems

Park NX-Mask - An AFM-based EUV Mask Repair and More | Park Systems

Video Credit: Park Systems

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