Kurt J. Lesker Company offer stand-alone ALD systems for basic research or
completely integrated deposition systems for complex R&D applications. All
of our ALD system platforms feature high speed ALD valves and integrated pumping,
pressure measurement, and gas delivery packages optimized for your specific
process.
Key features:
- Viscous flow ALD reactor chamber
- Cabnit design allows for large number of reactant inputs
- Heated stainless steel chamber with front-port substrate loading
- Accommodates 8" diameter substrates
- Substrate heating up to 500°C
- Heated lines to 200°C
- Fully exhausted cabinet with gas interlocks
- Recipe driven process control software
- Options include: remote plasma; load lock; gas bubbler with closed loop
control