AIXTRON AG today announced that in the fourth quarter 2008 the National Taiwan University (NTU), based in Taipei City, Taiwan, ordered one Close Coupled Showerhead 3x2" wafer Research Platform MOCVD system. It will be used for research and development on GaN and related materials and devices and it will be delivered in the third quarter 2009.
Professor Chih-Chung (C. C.) Yang of the Institute of Photonics and Optoelectronics, National Taiwan University, comments: “We have been researching on nitride-based alloy semiconductors for a number of years. Our experiments require a stable and reliable system with commonality and compatibility with Taiwan’s popular production technologies. Not only does AIXTRON’s CCS Research Platform suit this task very well but it also has a high degree of versatility. In particular, we are looking forward to using the Dynamic Reactor Height Adjustment option for growth at various reactor pressures. We are impressed with this unique capability and expect it will enable us to more rapidly implement our process development program.”
The AIXTRON Taiwan team is also eager to continuing its role in this project. AIXTRON Taiwan’s R&D and Process Manager Dr. Joe Yang, who in fact graduated from NTU in 2003, adds: “Our process team is naturally keen to ensure that the very best efforts go into this project so we can provide NTU with a parameter set to form an excellent base for their advanced R&D.”