The Semiconductor Metrology Systems Division (SMS) of Carl
Zeiss SMT strengthens its partner- ship with the Dresden based company HAP.
Both companies have signed an agreement making SMS the exclusive distributor
of a recently developed “Pellicle Removal Tool” for photomasks.
The system enables the automatic and gentle removal of pellicles from photomasks
used in semiconductor manufacturing. Such pellicles are fundamental to protect
the sensitive photomasks from contamination. The agreement marks a successful
milestone in the ongoing R&D collaborations between SMS and HAP such as
the development of the next generation photomask registration tool PROVE.
“We are happy to have found in HAP an innovative reliable partner, whose
competencies complement ours perfectly.” states Dr. Oliver Kienzle, Managing
Director of the SMS Division. “The system enables our customers to improve
the cleaning process of highly sensitive photomasks, which helps to improve
yields and therefore save costs”.
The company HAP develops special solutions for wafer and substrates in the
microelectronic industry and micro system technique.
“The cooperation with Carl Zeiss generates strong synergies for both
companies. We can participate in the worldwide sales and service network of
the SMS Division as well as their comprehensive expertise in the semiconductor
industry. SMS can provide its customers in the mask making industry a new technology
without their own R&D effort.” explains Dr. Steffen Pollack, Managing
The tool automatically removes the pellicle from a photomask by applying a
dedicated thermal and force recipe to the pellicle mount. This technology is
highly advantageous since it eliminates the drawbacks of standard manual pellicle
removal such as mask contamination, or in the worst case to the scrapping of
the mask. As photomasks carry the complete structural information of integrated
circuits, they are a key element in semiconductor manufacturing.