FEI today recently delivered the 250th Helios NanoLab DualBeam system. The solution offers SEM and FIB performance that will help address problems relating to furthering multi-disciplinary technology and sciences, according to John Williams, vice president of marketing, FEI.
It is being implemented by semiconductor producers for research and development, by academic and industrial research laboratories for material analysis and scaling down to a nanometer size and in life sciences and oil & gas industries. These multiple applications have been enabled by its three-dimensional imaging on any material, without damaging the material, at the nanoscale.
The series is versatile and incorporates the company’s HR scanning electron microscope (XHR SEM) with a focused ion beam (FIB), for enhanced imaging and milling capability.