Nanomechanics, Inc. to Host Instrumented Indentation Webinar Feb. 22

Leading nanomechanical technology provider will host educational webinar focused on the common problem of substrate influence when using nanoindentation to evaluate the elastic modulus of thin films

Nanomechanics, Inc., the leading provider of innovative products designed to enable users to evaluate and understand the mechanical performance of their materials on micro and non-scales, will host an educational webinar on the theory and practice of instrumented indentation on Wednesday, Feb. 22, from noon to 1 p.m. EST.

Instrumented indentation, also called nanoindentation, has developed over the last three decades as the technique of choice for measuring the mechanical properties of thin films and other small volumes of materials. The upcoming webinar will be based on the common problem of substrate influence when using nanoindentation to evaluate the elastic modulus of thin films.

Presented by Jennifer Hay, senior applications engineer for Nanomechanics, Inc., the lecture will focus on an elastic model for film-substrate interaction. This example returns accurate film moduli even when substrate influence is substantial. The new paradigm is applied to the interpretation of nanoindentation data on various thin films, including low-k films on silicon.

Anyone responsible for or interested in nanoindentation should attend to quickly gain a comprehensive understanding of the test method and what it can do. We want to enable those working in the field with the latest information on instrumented indentation, from process and test engineers to graduate students.

John Swindeman, CEO at Nanomechanics Inc

For more information on the Instrumented Indentation - Session 8: Nanoindentation of Thin Films webinar, on Wednesday, Feb. 22 from noon to 1 p.m. EST, visit http://www.nanomechanicsinc.com.

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