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Results 1 - 10 of 425 for Atomic Layer Deposition
  • Supplier Profile
    ALD NanoSolutions, Inc. was founded by Dr. Karen Buechler, Prof. Steven George, Mr. P. Michael Masterson, and Prof. Alan Weimer in order to commercialize atomic layer deposition technology to solve...
  • Supplier Profile
    Picosun Oy is the leading manufacturer of high quality Atomic Layer Deposition (ALD) equipment for global industries. Picosun provides the customers with efficient, reliable, and user-friendly ALD...
  • Supplier Profile
    NanoOpto was founded in 2000 with the mission to create a state of the art combined research, development and production facility to commercialize its unique patented and / or proprietary IP...
  • Supplier Profile
    Based in Louisville, Colo., Forge Nano is a global leader in surface engineering and precision nano-coating technology, using Atomic Layer Deposition. Forge Nano’s proprietary technology and...
  • Supplier Profile
    Continuing trends in technology-driven industries are driving towards increased performance, miniaturization, lower power consumption, lower production costs, and an environmentally friendly...
  • Article - 11 Oct 2006
    Oxford Instruments’ FlexAL product family provides a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma Atomic Layer Deposition...
  • Article - 4 May 2013
    Metal halides were the first kind of precursor used in CVD processes.
  • Article - 4 May 2013
    Extensive research is ongoing to explore the role of acetylacetonate complexes and their derivatives as precursors for depositing oxide films using CVD/ALD.
  • Article - 4 May 2013
    Cyclopentadienyl (Cp) complexes have become attractive precursors for CVD/ALD as they are normally volatile and reactive towards water at considerable .
  • Article - 4 May 2013
    For certain metals, such as nickel, chromium, iron, molybdenum, rhenium, rhodium and tungsten, carbonyl precursors have proved to be ideal.