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Results 1 - 10 of 392 for Atomic Layer Deposition
  • Supplier Profile
    Plasma Process Solutions We offer flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems...
  • Supplier Profile
    Our company aims to make Atomic Layer Deposition accessible to all researchers and developers worldwide. We manufacture compact ALD tools, providing pinhole-free thin films for: Nanotubes, Nanowires,...
  • Supplier Profile
    ALD NanoSolutions, Inc. was founded by Dr. Karen Buechler, Prof. Steven George, Mr. P. Michael Masterson, and Prof. Alan Weimer in order to commercialize atomic layer deposition technology to solve...
  • Supplier Profile
    Picosun Oy is the leading manufacturer of high quality Atomic Layer Deposition (ALD) equipment for global industries. Picosun provides the customers with efficient, reliable, and user-friendly ALD...
  • Supplier Profile
    NanoOpto was founded in 2000 with the mission to create a state of the art combined research, development and production facility to commercialize its unique patented and / or proprietary IP...
  • Supplier Profile
    Continuing trends in technology-driven industries are driving towards increased performance, miniaturization, lower power consumption, lower production costs, and an environmentally friendly...
  • Article - 11 Oct 2006
    Oxford Instruments’ FlexAL product family provides a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma Atomic Layer Deposition...
  • Article - 4 May 2013
    Metal halides were the first kind of precursor used in CVD processes. They are relatively inexpensive and readily available.
  • Article - 4 May 2013
    Extensive research is ongoing to explore the role of acetylacetonate (acac) complexes and their derivatives as precursors for depositing oxide films using CVD/ALD.
  • Article - 4 May 2013
    Cyclopentadienyl (Cp) complexes have become attractive precursors for CVD/ALD as they are normally volatile and reactive towards water at considerable temperatures and often form films with minimal...