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Results 61 - 70 of 542 for Atomic layer deposition
  • Applied Materials Advances Sub-90nm Contacts with New ALD Tungsten Technology - New Technology
    Article - 5 Dec 2003
    Applied Materials, Inc. has introduced its new iSprint(TM) Centura(R) system, the industry's only integrated 300mm ALD/CVD (Atomic Layer Deposition / Chemical Vapor Deposition) system for sub-90nm...
  • ALD 200L Series from Kurt J. Lesker Company
    Equipment
    Kurt J. Lesker Company offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of our ALD system platforms feature high speed ALD...
  • Universal Matter
    Supplier Profile
    Universal Matter has developed cleaner, faster, and less expensive technology to commercialize graphene, a carbon-based nanomaterial with multiple applications. Our proprietary Flash Joule Heating...
  • Protochips
    Supplier Profile
    Protochips is the leader for in situ (real-world) electron microscopy products. The revolutionary systems include Atmosphere for pressurized gas and heating, Poseidon Select for liquid; electrical and...
  • The Graphene Council
    Supplier Profile
    The Graphene Council  was founded in 2013 with a mission to serve the global community of graphene professionals. Today, The Graphene Council is the largest community in the world for graphene...
  • Cambridge Innovation Consulting
    Supplier Profile
    With access to 10,000s of researchers at the world’s top universities, CamIn is able to match the clients’ specific needs with the right experts’ abilities. The Problem CamIn...
  • Applications of Metal Halide Precursors in CVD/ALD Processes
    Article - 4 May 2013
    Metal halides were the first kind of precursor used in CVD processes.
  • Applications of Metal Diketonate Precursors for CVD and ALD
    Article - 4 May 2013
    Extensive research is ongoing to explore the role of acetylacetonate complexes and their derivatives as precursors for depositing oxide films using CVD/ALD.
  • Applications of Metal Cyclopentadienyl CVD/ALD Precursors
    Article - 4 May 2013
    Cyclopentadienyl (Cp) complexes have become attractive precursors for CVD/ALD as they are normally volatile and reactive towards water at considerable .
  • Metal Carbonyl Precursors for CVD and ALD Processes
    Article - 4 May 2013
    For certain metals, such as nickel, chromium, iron, molybdenum, rhenium, rhodium and tungsten, carbonyl precursors have proved to be ideal.

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