EVG’s SmartNIL technology stands out the company in the UV nanoimprint lithography market. In conjunction with a multi-use softstamp technology, SmartNIL provides unprecedented throughput, while maintaining maintenance-friendly operation and scalability with cost of ownership advantages.
Image Credit: Shutterstock/Jaros
The innovative technology realizes a low-cost and high- volume nanoimprint lithography technique for mass production of LEDs, photonics, optics, advanced data storage, as well as biotechnology devices such as microfluidics.
Technical Specifications of SmartNIL™ Imprint Technology
The technical specifications of SmartNIL™ Imprint Technology are listed in the following table:
| Parameter |
SmartNIL™ |
| Resolution |
40nm in HVM; down to sub 15nm in R&D |
| Throughput |
> 60 units per hour |
| Light Source |
Broadband exposure |
| Automated Separation |
Integrated |
| Inert Gas Printing |
Integrated |
| Multi-use Polymer Stamps |
> 100 imprints/ stamp |
| Stamp Fabrication |
Integrated |
| Open Material Platform |
Open for all commercially available imprint materials |
| Alignment |
Optional top side alignment |
Key Features of SmartNIL™ Imprint Technology
SmartNIL technology in first print mode delivers a throughput of > 60 units/hour, making it the fastest full substrate soft UV-NIL solution in the world. The following are the key features of SmartNIL™ Imprint Technology:
- Imprint over topographies
- Top side alignment
- Optical clearance with no visible vacuum lines in active imprint area
Key Features of SmartNIL™ Stamp Technology
The key features of EVG’s multi- use flexible polymer stamp technology include:
- Helps achieving the lowest cumulated processing costs
- Addresses cost and service life of incoming master stamp, a key characteristic in nanoimprint lithography
- Long range structure distortion and thermal mismatch can be avoided, thanks to room temperature and integrated stamp fabrication
- Low surface adhesion material facilitates isolation of substrate and stamp, while reducing friction
- Self cleaning properties of flexible stamp enable less particle sensitive imprint process with better overall processing yield
- Fabrication of SmartNIL stamps takes only minutes when compared to a PDMS casting process that takes 24 hours
Key Features of SmartNIL™ Equipment
The key features of SmartNIL™ Equipment include:
- SmartNIL is compatible to existing EVG mask aligner platforms
- SmartNIL works on dedicated imprint tools like the EVG®720
- It is easier to handle and maintain stamp and substrate (no tubings and plumbings)
- Enables imprint on a large area of up to 150mm2 (Figure 1) (scalable up to 300mm2 substrates)
- SmartNIL uses a mechanical de-emboss process in place of vacuum de-embossing
- SmartNIL provides integrated stamp production and imprinting
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Figure 1. Top image: SmartNIL™ replicated 150 mm substrate with 400 nm dots. Left image: SEM close up of 400 nm replicated dots.
Key Benefits of SmartNIL™ Imprint Technology
The following are the key benefits of SmartNIL™ Imprint Technology:
- Open materials platform
- Better overall processing yield
- Lowest total cost of ownership
- Operation and maintenance friendly
- Fully automated processing
- Scalable in substrate size up to 200mm2
- Low release force soft stamp polymers
- Automated separation of stamp and substrate
- Multi-use flexible soft stamps
- Works hand-in-hand with existing mask aligner platforms
- Fast and convenient stamp exchange
This information has been sourced, reviewed and adapted from materials provided by EV Group.
For more information on this source, please visit EV Group.