EVG SmartNIL Imprint Technology

EVG’s SmartNIL technology stands out the company in the UV nanoimprint lithography market. In conjunction with a multi-use softstamp technology, SmartNIL provides unprecedented throughput, while maintaining maintenance-friendly operation and scalability with cost of ownership advantages.

The innovative technology realizes a low-cost and high- volume nanoimprint lithography technique for mass production of LEDs, photonics, optics, advanced data storage, as well as biotechnology devices such as microfluidics.

Technical Specifications of SmartNIL™ Imprint Technology

The technical specifications of SmartNIL™ Imprint Technology are listed in the following table:

Parameter SmartNIL™
Resolution 40nm in HVM; down to sub 15nm in R&D
Throughput > 60 units per hour
Light Source Broadband exposure
Automated Separation Integrated
Inert Gas Printing Integrated
Multi-use Polymer Stamps > 100 imprints/ stamp
Stamp Fabrication Integrated
Open Material Platform Open for all commercially available imprint materials
Alignment Optional top side alignment

Key Features of SmartNIL™ Imprint Technology

SmartNIL technology in first print mode delivers a throughput of > 60 units/hour, making it the fastest full substrate soft UV-NIL solution in the world. The following are the key features of SmartNIL™ Imprint Technology:

  • Imprint over topographies
  • Top side alignment
  • Optical clearance with no visible vacuum lines in active imprint area

Key Features of SmartNIL™ Stamp Technology

The key features of EVG’s multi- use flexible polymer stamp technology include:

  • Helps achieving the lowest cumulated processing costs
  • Addresses cost and service life of incoming master stamp, a key characteristic in nanoimprint lithography
  • Long range structure distortion and thermal mismatch can be avoided, thanks to room temperature and integrated stamp fabrication
  • Low surface adhesion material facilitates isolation of substrate and stamp, while reducing friction
  • Self cleaning properties of flexible stamp enable less particle sensitive imprint process with better overall processing yield
  • Fabrication of SmartNIL stamps takes only minutes when compared to a PDMS casting process that takes 24 hours

Key Features of SmartNIL™ Equipment

The key features of SmartNIL™ Equipment include:

  • SmartNIL is compatible to existing EVG mask aligner platforms
  • SmartNIL works on dedicated imprint tools like the EVG®720
  • It is easier to handle and maintain stamp and substrate (no tubings and plumbings)
  • Enables imprint on a large area of up to 150mm2 (Figure 1) (scalable up to 300mm2 substrates)
  • SmartNIL uses a mechanical de-emboss process in place of vacuum de-embossing
  • SmartNIL provides integrated stamp production and imprinting

Top image: SmartNIL™ replicated 150 mm substrate with 400 nm dots. Left image: SEM close up of 400 nm replicated dots.

Figure 1. Top image: SmartNIL™ replicated 150 mm substrate with 400 nm dots. Left image: SEM close up of 400 nm replicated dots.

Key Benefits of SmartNIL™ Imprint Technology

The following are the key benefits of SmartNIL™ Imprint Technology:

  • Open materials platform
  • Better overall processing yield
  • Lowest total cost of ownership
  • Operation and maintenance friendly
  • Fully automated processing
  • Scalable in substrate size up to 200mm2
  • Low release force soft stamp polymers
  • Automated separation of stamp and substrate
  • Multi-use flexible soft stamps
  • Works hand-in-hand with existing mask aligner platforms
  • Fast and convenient stamp exchange

This information has been sourced, reviewed and adapted from materials provided by EV Group.

For more information on this source, please visit EV Group.

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    EV Group. (2019, May 23). EVG SmartNIL Imprint Technology. AZoNano. Retrieved on October 19, 2019 from https://www.azonano.com/article.aspx?ArticleID=3952.

  • MLA

    EV Group. "EVG SmartNIL Imprint Technology". AZoNano. 19 October 2019. <https://www.azonano.com/article.aspx?ArticleID=3952>.

  • Chicago

    EV Group. "EVG SmartNIL Imprint Technology". AZoNano. https://www.azonano.com/article.aspx?ArticleID=3952. (accessed October 19, 2019).

  • Harvard

    EV Group. 2019. EVG SmartNIL Imprint Technology. AZoNano, viewed 19 October 2019, https://www.azonano.com/article.aspx?ArticleID=3952.

Ask A Question

Do you have a question you'd like to ask regarding this article?

Leave your feedback
Submit