EVG SmartNIL Imprint Technology

EVG’s SmartNIL technology stands out the company in the UV nanoimprint lithography market. In conjunction with a multi-use softstamp technology, SmartNIL provides unprecedented throughput, while maintaining maintenance-friendly operation and scalability with cost of ownership advantages.

EVG SmartNIL Imprint Technology

Image Credit: Shutterstock/Jaros

The innovative technology realizes a low-cost and high- volume nanoimprint lithography technique for mass production of LEDs, photonics, optics, advanced data storage, as well as biotechnology devices such as microfluidics.

Technical Specifications of SmartNIL™ Imprint Technology

The technical specifications of SmartNIL™ Imprint Technology are listed in the following table:

Parameter SmartNIL™
Resolution 40nm in HVM; down to sub 15nm in R&D
Throughput > 60 units per hour
Light Source Broadband exposure
Automated Separation Integrated
Inert Gas Printing Integrated
Multi-use Polymer Stamps > 100 imprints/ stamp
Stamp Fabrication Integrated
Open Material Platform Open for all commercially available imprint materials
Alignment Optional top side alignment

Key Features of SmartNIL™ Imprint Technology

SmartNIL technology in first print mode delivers a throughput of > 60 units/hour, making it the fastest full substrate soft UV-NIL solution in the world. The following are the key features of SmartNIL™ Imprint Technology:

  • Imprint over topographies
  • Top side alignment
  • Optical clearance with no visible vacuum lines in active imprint area

Key Features of SmartNIL™ Stamp Technology

The key features of EVG’s multi- use flexible polymer stamp technology include:

  • Helps achieving the lowest cumulated processing costs
  • Addresses cost and service life of incoming master stamp, a key characteristic in nanoimprint lithography
  • Long range structure distortion and thermal mismatch can be avoided, thanks to room temperature and integrated stamp fabrication
  • Low surface adhesion material facilitates isolation of substrate and stamp, while reducing friction
  • Self cleaning properties of flexible stamp enable less particle sensitive imprint process with better overall processing yield
  • Fabrication of SmartNIL stamps takes only minutes when compared to a PDMS casting process that takes 24 hours

Key Features of SmartNIL™ Equipment

The key features of SmartNIL™ Equipment include:

  • SmartNIL is compatible to existing EVG mask aligner platforms
  • SmartNIL works on dedicated imprint tools like the EVG®720
  • It is easier to handle and maintain stamp and substrate (no tubings and plumbings)
  • Enables imprint on a large area of up to 150mm2 (Figure 1) (scalable up to 300mm2 substrates)
  • SmartNIL uses a mechanical de-emboss process in place of vacuum de-embossing
  • SmartNIL provides integrated stamp production and imprinting

Top image: SmartNIL™ replicated 150 mm substrate with 400 nm dots. Left image: SEM close up of 400 nm replicated dots.

Figure 1. Top image: SmartNIL™ replicated 150 mm substrate with 400 nm dots. Left image: SEM close up of 400 nm replicated dots.

Key Benefits of SmartNIL™ Imprint Technology

The following are the key benefits of SmartNIL™ Imprint Technology:

  • Open materials platform
  • Better overall processing yield
  • Lowest total cost of ownership
  • Operation and maintenance friendly
  • Fully automated processing
  • Scalable in substrate size up to 200mm2
  • Low release force soft stamp polymers
  • Automated separation of stamp and substrate
  • Multi-use flexible soft stamps
  • Works hand-in-hand with existing mask aligner platforms
  • Fast and convenient stamp exchange

This information has been sourced, reviewed and adapted from materials provided by EV Group.

For more information on this source, please visit EV Group.


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