Equipment |Atomic Layer Deposition (ALD) Systems

Atomic Layer Deposition (ALD) Systems

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Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. The majority of ALD reactions use two chemicals referred to as precursors. ALD provides a unique method for depositing ultrathin films on surfaces.

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Equipment

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for Atomic Layer Deposition (ALD) Systems

We will try and place you in contact with a suitable supplier within 48 hours.

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