ALD 200L Series from Kurt J. Lesker Company

Kurt J. Lesker Company offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of our ALD system platforms feature high speed ALD valves and integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.

Key features:

  • Viscous flow ALD reactor chamber
  • Cabnit design allows for large number of reactant inputs
  • Heated stainless steel chamber with front-port substrate loading
  • Accommodates 8" diameter substrates
  • Substrate heating up to 500°C
  • Heated lines to 200°C
  • Fully exhausted cabinet with gas interlocks
  • Recipe driven process control software
  • Options include: remote plasma; load lock; gas bubbler with closed loop control

Other Equipment

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.