Equipment |Plasma Cleaning Systems

Plasma Cleaning Systems

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Plasma cleaning is the common technique of getting rid of organic matter from an object’s surface by means of an ionized gas known as plasma. The technique frequently performed in a vacuum chamber using oxygen or argon gas. A plasma cleaning system is an environmentally-safe alternative to using harsh chemical solvents and an efficient way to remove small quantities of contaminants from a substrate.

When a gas takes up electrical energy, it grows hotter, triggering the ions to vibrate faster and “scrub” a surface. In semiconductor production, plasma cleaning is often employed to prepare a wafer surface just before wire bonding. Getting rid of any contamination leads to stronger wire bond adhesion, which boosts the dependability and endurance of a device.

In biomedical uses, plasma cleaning is used to boost compatibility between artificial biomaterials and natural tissues. Plasma cleaning reduces adverse reactions like inflammation and infection.

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Plasma Cleaning Systems

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