Evactron ES De-Contaminator: Vacuum Chamber Cleaning System for TESCAN SEM/FIB

Evactron has launched an ES De-Contaminator, which is a compact yet simplified plasma cleaner that delivers high performance. It has been developed specifically for Tescan Ion and Electron Beam Instruments, such as SEMs and FIBs.

The Evactron ES De-Contaminator can be cleaned in a simple way, thereby offering higher contrast imaging and resolution while enhancing the sensitivity of detectors and probes that are otherwise impacted by contamination.

The design of the Evactron ES Plasma Radical Source is compact, making it a universal solution for load locks, sample preparation chambers, or FIB/SEM chambers. The Evactron ES Plasma Cleaner offers quick, mild and effective cleaning throughout a wide range of pressures, thereby enabling artifact-free, high quality images as well as enhanced efficiency of sample analysis.

System Features

  • Energy-efficient radiofrequency hollow cathode plasma is available
  • RF power ranges from 10 to 20 W at 13.56 MHz
  • The Tescan GUI offers cleaning time and programmable power
  • Dual-action cleaning possible via plasma and UV afterglow
  • A wide range pressure operation—133 Pa to 3 Pa or 1 Torr to 22 mTorr
  • High vacuum 'pop' ignition available
  • Compliant with TMP and does not need advance venting
  • Guarantees quick cleaning that is over 60 times faster compared to the early generation of Evactron versions
  • Push-button cleaning operation can be done
  • Vacuum-safety interlock and external interlock connection (optional) is available
  • Sensitive components are prevented from being damaged as there is no sputter etch
  • PRS can be fixed on the SEM chamber or the load lock
  • Complies with TUV, NRTL, SEMI, RoHS and CE standards
  • Match or gas flow alterations are not needed for plasma ignition

The Evactron ES Plasma De-Contaminator was designed particularly for OEM integration for high vacuum, SEM, FIB and other analytical systems. The simplified Evactron Plasma Radical Source (PRS) has a compact footprint and makes use of air plasma afterglow to reduce hydrocarbon contamination, thereby offering quick and efficient results.

Specifications of Evactron ES System

  • Compact Plasma Radical Source (PRS) is available
  • Consists of 2U rack-mount controller for system integration
  • Hardware interlock (optional)
  • SEM/FIB host-directed control
  • RF power—10 to 20 W at 13.56 MHz CCP
  • Complies with TUV, NRTL, SEMI, RoHS and CE standards
  • 100 to 240 VAC and 50/60 Hz input

Other Equipment by this Supplier

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.