Oxford Instruments Asylum Research Announces Upcoming Webinar: “Measuring the Surface Roughness of Thin Films and Substrates with Atomic Force Microscopy”

Oxford Instruments Asylum Research announces an upcoming webinar titled “Measuring the Surface Roughness of Thin Films and Substrates with Atomic Force Microscopy.” Surface roughness is a useful metric for both monitoring deposition, etch, and polishing steps during processing and also a common quality control measure in finished materials. New materials and processes are resulting in surfaces with ultra-low roughness that are difficult or impossible to characterize with traditional stylus and optical profilometers. Atomic Force Microscopy (AFM) provides a solution that can quickly, easily, and accurately measure even sub-angstrom surface roughness.

Dr. Jason Li, Applications Group Manager at Asylum Research, will begin the webinar with an overview of surface roughness measurement types and the advantages that AFM offers compared to other common techniques. He will also outline some of the practical issues that should be considered when making these measurements. Dr. Marta Kocun, Product Line Manager at Asylum Research, will then share several cases studies of roughness measurements made on a variety of thin films and substrates. Along the way, she will point out how recent innovations at Asylum have made this much easier and faster while making the results more accurate and repeatable.

The webinar will be broadcast on Wednesday, July 29th, 2020 at 10-11 am EDT / 2-3 pm GMT. Attendees will have the opportunity to submit questions to the speakers during a question and answer period at the end. Those not able to attend at the scheduled time are encouraged to still register as they will be able to view the recorded webinar “on-demand” after the live event.

For more information see https://afm.oxinst.com/roughness-webinar.

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