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Ellipsometry is an optical metrolgy technique used for the characterization of thin films. In particular it measures complex refractive indix and dielectric function. It is used to characterize a range of materials form semiconductors to biologicals.
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The GES5E is the SOPRA core instrument for R&D applications. GES5E integrates advanced and well proven opto-mechanical designs coupled to high performance electronics, Spectrometers and spectrographs and user friendly WindowsTm software. GES5E is the most recent model of 5 generations of spectroscopic ellipsometers developed by SOPRA.
The SENresearch broadband spectroscopic ellipsometer family is designed to meet the requirements of modern research with special emphasis on speed and accuracy for an unmatched variety of applications.
The SENDIRA infrared ellipsometer covers the infrared spectral range from 1.7 µm up to 25 µm (6,000 cm-1 to 400 cm-1) with FTIR precision and high resolution. The SENDIRA provides detailed chemical, mechanical, electrical, and optical information on complex layer systems.
SOPRA has developed a Stand alone Fourier Transform Infra-Red Spectroscopic Ellipsometer (FTIR-SE) covering spectral range from 1.5µm to 17 µm (550 cm-1) as standard using highly sensitive MCT detector and to 33µm using Optional DTGS detector and special optics. The Infra Red ellipsometer can measure without contact and reference sample at atmopheric pressure and can be easely implemented in in-situ applications
The IR-VASE® is the first and only spectroscopic ellipsometer to cover the spectral range from 2 to 30 microns (333 to 5000 wavenumbers). The IR-VASE can determine both n and k for materials over the entire width of the spectral range without extrapolating data outside the measured range, as with a Kramers-Kronig analysis. Like other Woollam ellipsometers, the IR-VASE is perfect for thin films or bulk materials including dielectrics, semiconductors, polymers, and metals.
SOPRA produces a Spectroscopic Ellipsometer capable to work down to 135 nm. The entire spectral range is 135-650 nm. This enable to measure all the new materials designed for the next generation lithography (157 nm, Fe excimer laser), like photoresist, ARC layers and all the optics included in the next generation Stepper.
The M-2000 line of spectroscopic ellipsometers is engineered to meet the diverse demands of thin film characterization. An advanced optical design, wide spectral range, and fast data acquisition make it an extremely powerful and versatile tool. The M-2000 delivers both speed and accuracy. Our patented RCE technology combines Rotating Compensator Ellipsometry with high-speed CCD detection to collect data from the entire spectrum (hundreds of wavelengths) in a fraction of a second with a wide array of configurations.
For routine measurements of thin film thickness and refractive index, the alpha-SE® is a great solution. Designed for ease-of-use: simply mount a sample, choose the model that matches your film, and press measure. You have results within seconds.
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