Posted in | Nanoanalysis

New Nano Webinar Announced by Oxford Instruments Plasma Technology

Published on March 17, 2014 at 9:58 AM

Oxford Instruments Plasma Technology announces a webinar that will focus on recent nanoscale etch and atomic layer deposition (ALD) advances from research to manufacturing applications.

‘ALD and nanoscale etch processing techniques and results at Lawrence Berkeley National Laboratory (LBNL), USA’ presented by Deirdre Olynick, Staff Scientist at LBNL, CA, USA, will be followed by ‘Challenges and Opportunities in Fabrication of Bit Patterned Media with Areal Density Beyond 1 Tdpsi’ from speaker Kim Lee, Seagate, CA, USA.

Bit patterned media (BPM) recording is currently being considered for the next generation high capacity magnetic recording. However, BPM presents extreme fabrication challenges, principally in lithography and pattern transfer, because of the small feature size and the tight spacing tolerance requirements. In lithography, directed self-assembly (DSA) of block copolymers has been proposed as a viable lithography strategy for BPM patterning.

Says Kim Lee, “At Seagate, a DSA process with sphere-forming PS-b-PDMS pattern (hcp) for coherent dot patterning over large area at density of up to 3.2 Tdpsi (center to center spacing of 15nm) has been developed. Using quartz templates patterned by this process, BPM media with areal density of up to 1.5Tdpsi have been successfully fabricated by NIL (nano-imprint lithography) and IBE (ion-beam etching) on 2.5” disks. Although significant progress in BPM patterning by DSA has been achieved, including incorporation of fully functional servo patterns, many challenges lay ahead. These include areal density extensibility of spherical BCP, and dot size and position variation control in DSA and pattern transfer.”

Possible solutions such as patterning by DSA of lamellar BCP coupled with double patterning process, and the requirements for advanced RIE processes for nano-pattern transfer will be discussed.

Dr David Haynes, Sales and Marketing Director at Oxford Instruments Plasma Technology comments, “One of our strengths as a business is that our high technology tools and processes transfer very effectively from ‘lab to fab’ and these talks from industry renowned speakers will demonstrate this very point, in addition to bringing the listener the most up to date information on advances in data storage from the experts”

The webinar on Wed 26th March at 5pm (GMT), 9am Pacific Time is free of charge, and will run for 1 hour including time for questions and answers at the end.

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