the leading manufacturer of UV-visible-NIR microscopes and microspectrometers,
is pleased to announce the QDI 2010 Film™ microspectrophotometer. The
QDI 2010 Film™ instrument is designed to measure the thickness of thin
films of photovoltaic cells rapidly and non-destructively. Able to analyze films
of many materials on both transparent and opaque substrates, the QDI 2010 Film™
enables the user to determine thin film thickness of even microscopic sampling
This powerful tool also has a host of other functions. It can be combined with
CRAIC Technologies proprietary contamination imaging capabilities and can even
test the transmissivity of PV cell protective covers. As such, the QDI 2010
Film™ represents a major step forward in metrology instrumentation available
to the photovoltaic industry.
"Many of our customers want to test the quality of photovoltaic devices
for rapid quality control of their products. The QDI 2010 Film™ microspectrophotometer
was built in response to customer requests for a powerful, flexible metrology
tool that can test a number of different aspects of many different photovoltaic
devices" says Dr. Paul Martin, President.
The complete QDI 2010 Film™ solution combines advanced microspectroscopy
with sophisticated software to enable the user to measure film thickness by
either transmission or reflectance of many types of materials and substrates.
Due to the flexibility of the CRAIC Technologies design, sampling areas can
range from over 100 microns across to less than a micron. Designed for the production
environment, it incorporates a number of easily modified metrology recipes,
the ability to measure new films and sophisticated tools for analyzing data.
Other features such as contamination analysis and transmissivity testing are
easily added to this instrument.
For more information about QDI 2010 Film™ microspectrophotometer and
its applications, visit www.microspectra.com.