Nanometrics Incorporated
(Nasdaq:NANO), a leading supplier of advanced process control metrology
systems used primarily in the manufacturing and packaging of semiconductors,
solar photovoltaics and high-brightness LEDs, today announced a multiple system
order for its Caliper Mosaic overlay metrology system. The systems will be used
in production running in conjunction with the Blossom overlay target technology
and are expected to be delivered and qualified in the third quarter of 2009.
The Caliper Mosaic systems were ordered as a follow on to an initial system
purchased in 2008 from a leading DRAM manufacturer for high volume lithography
process control. The customer will also purchase licenses for the Blossom overlay
target technology.
“The Blossom overlay mark, when used in conjunction with our Caliper
Mosaic systems enables customers to extend their known metrology technologies
while continuing to leverage improvements in precision and throughput,”
commented Nigel Smith, Director of Overlay Product Technology at Nanometrics.
“The Blossom technology is gaining traction as an alternative to established
target schemes as it enables our customers to measure up to 28 layers at one
time. This simultaneous multi-layer measurement capability is especially beneficial
in double patterning processes, offering the best possible precision for advanced
lithography process control of critical layers, while substantially reducing
total target real-estate requirements.”