By Cameron Chai
US- based Nanometrics, which specialises in providing the latest metrology systems has announced that it has won an order from a prominent Korean memory manufacturer to provide its IMPULSE integrated metrology optical critical dimension (OCD) and film analysis system. After detailed evaluation, the Korean manufacturer chose Nanometrics to provide the systems to control its chemical mechanical planarization (CMP) process.
The unnamed Korean manufacturer had also placed an earlier order for the 100% automated Atlas OCD platform provided by Nanometrics. With this, Nanometrics has become the sole supplier of OCD- based products for its Korean client. The company’s IMPULSE system has also become the tool-of-record for the CMP process control, which is used for large scale manufacturing at the 2 nm mode.
Nanometrics, headquartered in California provides metrology systems to control the process in the areas of solar photovoltaics, data storage devices, semiconductors and high-brightness LEDs. The metrology systems offered by the company not only measure the electrical, optical and material properties of the film but also measure important aspects of the process such as dimensions, topography, overlay registration and device structures. According to Steve Bradley, Director of Integrated Metrology Business Unit of Nanometrics, the company will formulate its products according to the requirement s of its client and will contribute effectively to the technological developments of the client and any increase in their future production rates.