Posted in | Nanoanalysis

Vistec Electron Beam Established US Show Room Facility with Variable Shaped Beam Lithography System

Vistec Electron Beam GmbH, a leading supplier of electron-beam lithography systems, announced today, that it has established a show room  facility in Schaumburg, IL to promote and demonstrate their Variable Shaped Beam systems specifically for the US and North America market.

The show room facility in Schaumburg is designed to demonstrate the functionality and operation of Vistec's ebeam equipment and to provide an insight into its various applications.

The key component of the facility is a fully operational Vistec SB254 electron-beam lithography system, installed in a clean room of 970sqft., supplemented by a set of process and measurement equipment for standard sample processing.

"We are very pleased to be able to offer such a demonstration capability to potential North America market customers. The availability of the show room facility shall manifest our commitment to this important high technology region, it  will foster our activities to better understand customer needs and shall help to provide tailored solutions to their specific requirements." comments Wolfgang Dorl, General Manager of Vistec Electron Beam.

Vistec Electron Beam

Vistec Electron Beam GmbH provides leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research such as silicon direct write, compound semiconductor, mask making, integrated optics and several new emerging markets.

The company is located in Jena, Germany. In addition to its production facility in Germany, Vistec Electron Beam maintains service and support centers in Europe, Taiwan and the US.

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