As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography (EBL).
Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.
Vistec Electron Beam Established US Show Room Facility with Variable Shaped Beam Lithography System
Electron-Beam Lithography Systems Supplier, Vistec Electron Beam, Establishes Show Room Facility in Schaumburg, IL
Vistec SB254 System Purchased By Fraunhofer ENAS
ITME Purchases Vistec’s Advanced Electron-Beam Lithography System
eBeam's Advancements in Maskless Lithography to be Presented at SPIE Symposium
Vistec Combines New Air-Bearing Stage Platform with Electron-Beam Lithography Systems
Vistec Electron Beam Enters into Project with MIET
Vistec Announces Collaboration Focusing on Design-for-E-Beam Solutions for 45 and 32-nm Nodes
KLA-Tencor Acquires Microelectronic Inspection Equipment of Vistec Semiconductor
KLA-Tencor Acquires MIE Business Unit of Vistec Semiconductor Systems
Vistec Semiconductor Systems Named Supplier of the Year By The Advanced Mask Technology Center
The Vistec SB3050-2 Variable Shaped Beam System
High Performance Electron-beam Lithography System SB254