Nanoimprint Lithography Templates RSS Feed - Nanoimprint Lithography Templates

Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes.
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Eulitha's nanoimprint templates are manufactured with electron beam or its unique EUV lithography technology. Standard templates include 35 nm half-pitch linear gratings and 53 nm half-pitch dot arrays, both of which are made with exceptional quality thanks to the EUV exposure capability. Custom made templates are made according to customer specifications with the most suitable technology choice: EUV technology enables production of high-resolution periodic structures (sub-100nm) over large areas whereas e-beam is used for making arbitrary patterns.