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Posted in | Nanofabrication

Oxford Instruments to Host Nanoscale Plasma Processing Workshop

Published on August 23, 2011 at 1:22 AM

Oxford Instruments is continuing its successful series of workshops, with a one day 'Nanoscale Plasma Processing' event in Grenoble, France on Tuesday 18th October. This workshop will be particularly relevant to all those people working in industry and academia, with an interest in research and development advances, plus future trends in the fabrication and application of micro & nano structures and devices.

Organised by Oxford Instruments Plasma Technology, the event takes place at the prestigious French research centre CEA-LETI in Grenoble, France. The workshop will comprise of presentations, discussions, and a networking lunch, focussing on latest innovations in MEMS Etch developments, Ion Beam Etch and Deposition, Atomic Layer Deposition, Silicon and III-V Etch for nanowire applications and more.

We're delighted that invited Guest speakers from key research institutes will discuss their research and include: Prof Daniel Alquier, Directeur, LMP, Tours; a speaker from IEMN, Lille; and Dr Alex Robinson, University of Birmingham, UK. In addition, experts in their field from Oxford Instruments will speak on the latest process and application developments in a number of plasma processing areas.

"We've been hosting these successful seminars worldwide for several years, most recently at IOS-CAS in China, Lawrence Berkeley National Laboratory USA and the University of Southampton, UK, attracting many scientists to each event", comments Mike Smyth, EMEA Business Manager, Oxford Instruments Plasma Technology, "We've chosen Grenoble as our next venue as it is a hub for innovation in France. These workshops are a terrific opportunity for academic and industrial technologists to network and share ideas".

There is no charge for this workshop, however advance booking is essential.

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