Jul 21 2009
CEA-Leti and MAPPER Lithography announce today that MAPPER has delivered one of its massively parallel electron beam platforms to CEA-Leti.
This delivery is part of the collaboration program between MAPPER and CEA-Leti targeting development of maskless lithography for IC manufacturing for 22nm and beyond. The 300mm, 110-beam platform will be upgraded over the coming two years to reach industrial maturity. The MAPPER platform is the core technology on which the three-year IMAGINE program is built. This program provides the world’s major chip manufacturers with the opportunity to assess the maskless lithography technology in a real manufacturing environment. In addition, this program will develop and qualify the complete infrastructure from data preparation to process integration, in preparation for its industrial introduction.
“July 2009 is an important month in MAPPER’s history, since we will be shipping our first two machines,” said Christopher Hegarty, MAPPER’s CEO. “Given CEA-Leti’s extensive expertise in e-beam lithography, we are delighted that one of our machines is installed at their fab in line with our roadmap. We are looking forward to working with industry partners to get this technology to a manufacturing level.”
Olivier Demolliens, head of Nanotec at CEA-Leti said, “This is a very important step as it is the first attempt to install such equipment in an industrial environment, and we are very excited to do it at CEA-Leti. By sharing developments with our partners, we are on the way to establishing the potential of the multibeam technology and to offer new promising perspectives to the semiconductor industry.”