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Confining Charge Transport and Recombination to Nanoscale Areas Increases Efficiency of OLEDs

Confining Charge Transport and Recombination to Nanoscale Areas Increases Efficiency of OLEDs

Organic light emitting diodes (OLEDs), which are made from carbon-containing materials, have the potential to revolutionize future display technologies, making low-power displays so thin they'll wrap or fold around other structures, for instance. [More]
SUSS MicroTec Receives Large Lithography Tools Order from TDK

SUSS MicroTec Receives Large Lithography Tools Order from TDK

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, has received a large order for various lithography tools from TDK in Q4 2014. Delivery and installation will take place already in the first quarter 2015. [More]
SUNY Poly CNSE Recognized at SPIE Advanced Lithography 2015 for Pioneering Lithography Research

SUNY Poly CNSE Recognized at SPIE Advanced Lithography 2015 for Pioneering Lithography Research

As a testament to Governor Andrew M. Cuomo’s high-tech blueprint for New York State, SUNY Polytechnic Institute’s Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE) announced that it is once again playing a major role at SPIE Advanced Lithography, a leading lithography-focused forum, with forty technical papers by SUNY Poly CNSE faculty, staff, and students and its corporate partners accepted for presentation. [More]
Canon Announces Development of Next-Generation Nanoimprint Semiconductor Production System

Canon Announces Development of Next-Generation Nanoimprint Semiconductor Production System

Canon U.S.A. Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., is developing a next-generation semiconductor lithography system employing nanoimprint technology that makes possible sub-20 nm1 high-resolution processes. [More]
Asian Customer Places Order for Two Mycronic FPS Mask Writers

Asian Customer Places Order for Two Mycronic FPS Mask Writers

Mycronic AB (publ), has received order for two FPS mask writers from an existing customer in Asia. Delivery is scheduled during the second half of 2016 at the latest. [More]
The University of Manchester Uses Oxford Instruments Tools for Ground Breaking Graphene Research

The University of Manchester Uses Oxford Instruments Tools for Ground Breaking Graphene Research

Ground breaking research into graphene and other 2D materials will take place at The University of Manchester’s new National Graphene Institute using multiple, recently purchased, plasma etch and deposition systems from Oxford Instruments. [More]
Toshiba and SK hynix Enter Agreement to Jointly Develop Nano Imprint Lithography

Toshiba and SK hynix Enter Agreement to Jointly Develop Nano Imprint Lithography

Toshiba today announced that it has entered into a definitive agreement with SK hynix on joint development of Nano Imprint Lithography (NIL). Engineers from the two companies will start development of basic technologies for the process at Toshiba’s Yokohama Complex in Yokohama, Japan in April this year, targeting practical use in 2017. Today’s announcement builds on an MOU that the companies signed in December last year. [More]
Leading OSAT Facility Acquires Rudolph JetStep® Advanced Packaging Lithography System

Leading OSAT Facility Acquires Rudolph JetStep® Advanced Packaging Lithography System

Rudolph Technologies, Inc. announced today that it has shipped the JetStep® Advanced Packaging Lithography System to a leading outsourced assembly and test (OSAT) facility. This new customer will use the JetStep W Series for fan-out wafer level packaging (FO-WLP) applications. [More]
Bristol Awarded £450,000 to Develop GaN Nano-Engineered Semiconductors

Bristol Awarded £450,000 to Develop GaN Nano-Engineered Semiconductors

The Universities of Bath, Bristol, Sheffield and Strathclyde and their industrial partners have been given funding to develop the UK into a future hub for the manufacture of advanced semiconductor materials. [More]
Atomic Force Microscopy Etches Nanoscale Patterns on Conductive Polymers

Atomic Force Microscopy Etches Nanoscale Patterns on Conductive Polymers

Researchers at Oak Ridge National Laboratory (ORNL) have successfully carved out nanoscale designs on polymer surfaces using atomic force microscopy (AFM). [More]
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