Nanolithography News RSS Feed - Nanolithography

Polymer Mold Forms Perfect 3D-Structured Single-Crystal Nanostructures

Polymer Mold Forms Perfect 3D-Structured Single-Crystal Nanostructures

Polymer engineers from Cornell University have created a novel mold for nanostructures which is capable of forming liquid silicon from organic polymer materials. [More]
Asian Customer Places Order for Mycronic FPS Mask Writer

Asian Customer Places Order for Mycronic FPS Mask Writer

Mycronic AB, has received order for an FPS mask writer within the multi purpose segment from a customer in Asia. The system is scheduled for delivery in mid-2016. [More]
SUSS MicroTec, Georgia Tech Enter Collaboration for Nanotechnology, Bio-Medical and Semiconductor 3D Packaging Research

SUSS MicroTec, Georgia Tech Enter Collaboration for Nanotechnology, Bio-Medical and Semiconductor 3D Packaging Research

SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, and the Georgia Institute of Technology (Georgia Tech) announced today a collaboration for nanotechnology, bio-medical and semiconductor 3D packaging research. [More]
KAIST Develops Flexible PRAM Enabled By Self-Assembled BCP Silica Nanostructures

KAIST Develops Flexible PRAM Enabled By Self-Assembled BCP Silica Nanostructures

Phase change random access memory (PRAM) is one of the strongest candidates for next-generation nonvolatile memory for flexible and wearable electronics. In order to be used as a core memory for flexible devices, the most important issue is reducing high operating current. The effective solution is to decrease cell size in sub-micron region as in commercialized conventional PRAM. However, the scaling to nano-dimension on flexible substrates is extremely difficult due to soft nature and photolithographic limits on plastics, thus practical flexible PRAM has not been realized yet. [More]
Unique Gold Nano Spirals Could Help Prevent Identity Theft

Unique Gold Nano Spirals Could Help Prevent Identity Theft

The world's smallest continuous spirals have been created at Vanderbilt University in Nashville, Tennessee. The spirals react in a unique way to polarized infrared light, which makes them very hard to counterfeit - this property could be used to prevent counterfeiting of currency, credit cards, or ID cards. [More]
Novel Blurring-Free Stencil Lithography Patterning for Nanoaperture Optical Antenna Fabrication

Novel Blurring-Free Stencil Lithography Patterning for Nanoaperture Optical Antenna Fabrication

Congratulation to Valentin Flauraud and co-authors for their recent publication in Nanoletters about Large-scale arrays of Bowtie Nanoaperture Antennas for Nanoscale Dynamics in Living Cell Membranes. [More]
MESA+ NanoLab Acquires Eulitha PHABLE Photolithography System

MESA+ NanoLab Acquires Eulitha PHABLE Photolithography System

EULITHA, a Swiss startup company offering innovative lithography equipment and services for the nanotechnology, photonics and optoelectronic markets announced today the delivery of its unique PhableR 100 photolithography tool to the MESA + NanoLab of the University of Twente in the Netherlands. [More]
Vistec Electron Beam Announces Establishment of Showroom Facility in Schaumburg, IL

Vistec Electron Beam Announces Establishment of Showroom Facility in Schaumburg, IL

Vistec Electron Beam GmbH, a leading supplier of electron-beam lithography systems, announced today that it has established a showroom facility in Schaumburg, IL to promote and demonstrate their Variable-Shaped Beam systems specifically for the US and North America market. [More]
ZEISS Devlops MeRiT neXT Low Energy-Beam Mask Repair System

ZEISS Devlops MeRiT neXT Low Energy-Beam Mask Repair System

The new ZEISS MeRiT neXT mask repair tool hosts the innovative ZEISS low energy ebeam column, which enables the repair of smallest possible clear and opaque defects with the highest accuracy. The low energy beam increases the process resolution and simultaneously reduces side effects. [More]
Elionix Electron Beam Lithography System to be Installed at CUNY Advanced Science Research Center

Elionix Electron Beam Lithography System to be Installed at CUNY Advanced Science Research Center

SEMTech Solutions, in partnership with Elionix, is pleased to announce the delivery of a 100kV Electron Beam Lithography (EBL) system to the City University of New York’s (CUNY) Advanced Science Research Center (ASRC). [More]