Nanonex Corporation, a pioneer and leading company in nanoimprint solutions, today announced the successful delivery and installation of a new nanoimprint lithography (NIL) manufacturing system, the NX-M200B, to a maj...
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Physicists at the Ruhr-Universität Bochum (RUB) have found out how tiny islands of magnetic material align themselves when sorted on a regular lattice - by measurements at BESSY II. Contrary to expectations, the north and south poles of the magnetic islands did not arrange themselves in a zigzag pattern, but in chains.
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Dr. Stephen Y. Chou, Founder of Nanonex Corporation, will be giving a tutorial titled “Nanoimprint Lithography and Applications” at IEEE Nano 2013 in Beijing, China, on August 5th 2013.
Nanoimprint, in...
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Northwestern University scientist Chad A. Mirkin, a world-renowned leader in nanotechnology research and its application, has been named 2013 Chemistry World Entrepreneur of the Year by the Royal Society of Chemistry (RSC). The award recognizes an individual’s contribution to the commercialization of research.
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Rudolph Technologies, Inc., a leading provider of process characterization, photolithography equipment and software for the semiconductor, FPD, LED and solar industries, announced today that the first of its new JetStep™ Photolithographic Systems has been accepted and sold to a leading provider of advanced semiconductor packaging and test services.
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Cadence Design Systems, Inc., a leader in global electronic design innovation, announced today that GLOBALFOUNDRIES has collaborated with Cadence® to provide pattern classification data for manufacturing processes of 20 and 14 nanometers.
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C. Grant Willson, professor of chemistry and chemical engineering, received the Japan Prize for his development of a process that is now used to manufacture nearly all of the microprocessors and memory chips in the world. The Japan Prize is an international award similar to the Nobel Prize.
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Molecular Imprints, Inc. (MII), a technology leader in advanced semiconductor lithography and the market and technology leader for nanopatterning systems and solutions, today announced the shipment of the first of three advanced imprint modules scheduled for this quarter that will be integrated into MII's equipment partner's stepper systems.
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Ultratech, Inc., a leading supplier of lithography and laser-processing systems, today announced that it is a recipient of the 2012 Supplier Excellence Award from Texas Instruments Incorporated (TI).
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In an effort that will accelerate commercialization of extreme ultraviolet (EUV) lithography technology and the development of next-generation transistors, SEMATECH announced today that Intermolecular, Inc. has joined SEMATECH's Lithography and Front End Processes (FEP) programs.
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