Leader in processes and systems for etching, deposition and growth, Oxford
Instruments Plasma Technology (OIPT), has just launched the Nanofab800Agile
System. This new tool extends the Nanofab range of highly flexible tools and
proven processes which deliver catalyst treatment and controllable growth of
nanotubes and nanowires, in addition to delivering standard and high temperature
PECVD.
The Nanofab800Agile System provides development opportunities to influence
the growth of nanostructures. With temperature up to 800oC, and agile heating
and cooling for rapid turnaround the System also delivers control of alignment
and dimensions of the nanostructures.
Additional benefits include variable sample sizes up to maximum 200mm wafers,
excellent temperature uniformity, and agile temperature control. The system
is configured with a vacuum load lock to ensure process repeatability and chamber
cleanliness.
Featuring an optional liquid source delivery system, and with custom developed
setup for aligned growth and control of film stress, the Nanofab800Agile has
the ability to process in high pressure and high flow regimes.
Ian McKinlay, Senior Product Manager for OIPT comments, “As a company
we are constantly striving to improve the product offering to our customers.
This latest addition to our range means our customers will benefit from advanced
features, such as rapid heating and cooling cycles, excellent temperature uniformity
and process control. This is backed up by OIPT’s extensive process library
and applications expertise, combined with our commitment to ongoing excellent
customer service and support.”