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Oxford Instruments Plasma Technology Announces the Launch of Nanofab 800 Agile System

Published on September 3, 2009 at 6:21 AM

Leader in processes and systems for etching, deposition and growth, Oxford Instruments Plasma Technology (OIPT), has just launched the Nanofab800Agile System. This new tool extends the Nanofab range of highly flexible tools and proven processes which deliver catalyst treatment and controllable growth of nanotubes and nanowires, in addition to delivering standard and high temperature PECVD.

The Nanofab800Agile System provides development opportunities to influence the growth of nanostructures. With temperature up to 800oC, and agile heating and cooling for rapid turnaround the System also delivers control of alignment and dimensions of the nanostructures.

Additional benefits include variable sample sizes up to maximum 200mm wafers, excellent temperature uniformity, and agile temperature control. The system is configured with a vacuum load lock to ensure process repeatability and chamber cleanliness.

Featuring an optional liquid source delivery system, and with custom developed setup for aligned growth and control of film stress, the Nanofab800Agile has the ability to process in high pressure and high flow regimes.

Ian McKinlay, Senior Product Manager for OIPT comments, “As a company we are constantly striving to improve the product offering to our customers. This latest addition to our range means our customers will benefit from advanced features, such as rapid heating and cooling cycles, excellent temperature uniformity and process control. This is backed up by OIPT’s extensive process library and applications expertise, combined with our commitment to ongoing excellent customer service and support.”

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